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AlTiSiCON ultra-hard coating and preparation method thereof

A hard coating, coating technology, applied in coating, metal material coating process, ion implantation plating and other directions, to achieve the effect of improving corrosion resistance, high ionization rate and reducing friction coefficient

Active Publication Date: 2019-09-20
合肥永信信息产业股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

High-quality cutting tools are often played by the coating. The traditional single TiN coating can no longer meet the demand. How to prepare high-performance hard coatings is the research and development direction of many enterprises and research institutes.

Method used

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  • AlTiSiCON ultra-hard coating and preparation method thereof
  • AlTiSiCON ultra-hard coating and preparation method thereof
  • AlTiSiCON ultra-hard coating and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0047] An AlTiSiCON superhard coating in this embodiment is 3-4 μm thick and is suitable for drill bits and the like.

[0048] The coating is a multilayer structure, such as figure 1 As shown, it includes a TiN primer layer, an AlTiN layer, an AlTiSiCN layer, an AlTiN layer, an AlTiSiCN layer, and an AlTiSiCON surface layer from the inside to the outside. The AlTiN layer, AlTiSiCN layer, AlTiN layer, and AlTiSiCN layer between the TiN primer layer and the AlTiSiCON surface layer constitute an alternate layer of AlTiN and AlTiSiCN as a whole.

[0049] Among them, the thickness of the TiN primer layer is 0.1-0.2 μm; the thickness of the single-layer AlTiN layer in the interlaced layer of AlTiN and AlTiSiCN is 0.2-0.3 μm; the thickness of the single-layer AlTiSiCN layer in the interlaced layer of AlTiN and AlTiSiCN is 0.2-0.4 μm ; AlTiSiCON surface thickness of 1.0-2.5μm.

Embodiment 2

[0051] An AlTiSiCON superhard coating in this embodiment has a thickness of 1.5-3 μm and is suitable for milling cutters, gear hobbing cutters, stamping dies and the like.

[0052] The coating is a multilayer structure, such as figure 1 As shown, it includes a TiN primer layer, an AlTiN layer, an AlTiSiCN layer, an AlTiN layer, an AlTiSiCN layer, and an AlTiSiCON surface layer from the inside to the outside. The AlTiN layer, AlTiSiCN layer, AlTiN layer, and AlTiSiCN layer between the TiN primer layer and the AlTiSiCON surface layer constitute an alternate layer of AlTiN and AlTiSiCN as a whole.

[0053] Among them, the thickness of the TiN primer layer is 0.1-0.2 μm; the thickness of the single-layer AlTiN layer in the interlaced layer of AlTiN and AlTiSiCN is 0.15-0.2 μm; the thickness of the single-layer AlTiSiCN layer in the interlaced layer of AlTiN and AlTiSiCN is 0.15-0.3 μm ; AlTiSiCON surface thickness of 0.8-2.0μm.

Embodiment 3

[0055] An AlTiSiCON superhard coating in this embodiment is less than 1.5 μm thick and is suitable for taps with high precision requirements.

[0056] The coating is a multilayer structure, such as figure 1 As shown, it includes a TiN primer layer, an AlTiN layer, an AlTiSiCN layer, an AlTiN layer, an AlTiSiCN layer, and an AlTiSiCON surface layer from the inside to the outside. The AlTiN layer, AlTiSiCN layer, AlTiN layer, and AlTiSiCN layer between the TiN primer layer and the AlTiSiCON surface layer constitute alternate layers of AlTiN and AlTiSiCN.

[0057] Among them, the thickness of the TiN primer layer is 0.1-0.2 μm; the thickness of the single-layer AlTiN layer in the interlaced layer of AlTiN and AlTiSiCN is 0.1-0.15 μm; the thickness of the single-layer AlTiSiCN layer in the interlaced layer of AlTiN and AlTiSiCN is 0.1-0.2 μm ; AlTiSiCON surface thickness of 0.5-1.0μm.

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Abstract

The invention relates to the field of vacuum film coating, and provides an AlTiSiCON ultra-hard coating. The coating is of a multi-layer structure and comprises a TiN bottom layer, an AlTiN layer, an AlTiSiCN layer, an AlTiN layer, an AlTiSiCN layer, and an AlTiSiCON surface layer which are sequentially arranged from inside to outside, wherein the AlTiN layer, the AlTiSiCN layer, the AlTiN layer and the AlTiSiCN layer between the TiN bottom layer and the AlTiSiCON surface layer form an AlTiN and AlTiSiCN staggering layer. The invention also provides a method for preparing the AlTiSiCON ultra-hard coating by an arc ion plating technology. The AlTiSiCON ultra-hard coating and the preparation method thereof have the advantages that the coating is applicable to the surfaces of a cutter, a die and a core part to achieve high hardness, low frictional coefficient, and outstanding high temperature and corrosion resistance; and the service life of a workpiece is effectively prolonged.

Description

technical field [0001] The invention relates to the field of vacuum coating, in particular to an AlTiSiCON superhard coating prepared by vacuum ion plating technology and a specific preparation method thereof. Background technique [0002] Physical vapor deposition technology includes evaporation plating, sputtering plating, ion plating, etc. Compared with evaporation plating and sputtering plating, ion plating technology has the advantages of high ionization rate and good film-substrate bonding force. The development and application of traditional ion plating technology starts from the golden yellow TiN coating. With the diversification of tool processing environments, the requirements for tools are getting higher and higher. High-quality cutting tools are often played by coatings. The traditional single TiN coating can no longer meet the demand. How to prepare high-performance hard coatings is the research and development direction of many enterprises and research institut...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/32C23C14/02
CPCC23C14/0021C23C14/022C23C14/0641C23C14/0664C23C14/0676C23C14/32
Inventor 李灿民陶满李亚军张胜利
Owner 合肥永信信息产业股份有限公司
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