Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Target rolling method

A target and blank technology, which is applied in metal rolling, metal rolling, tool manufacturing, etc., can solve the problems of affecting the coating quality, target sputtering performance needs to be improved, target sputtering performance restricts coating mechanical properties, etc.

Inactive Publication Date: 2019-07-12
KONFOONG MATERIALS INTERNATIONAL CO LTD
View PDF9 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The sputtering performance of the target restricts the mechanical properties of the coating and affects the quality of the coating
[0005] However, the sputtering performance of existing targets needs to be improved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Target rolling method
  • Target rolling method
  • Target rolling method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] It can be seen from the background technology that the sputtering performance of existing targets still needs to be improved.

[0029] An analysis is now made in conjunction with a target rolling method. The process steps of the target rolling method mainly include: providing a target blank; performing heat treatment on the target blank; , performing a calendering process on the target blank until the target blank is made into a target material.

[0030] The sputtering performance of the target material rolled by the above method is poor. The reason for the analysis is that although the heat treatment can reduce the hardness of the target material blank, during the rolling process, as the target material The temperature of the blank gradually decreases, and the hardness of the target blank gradually increases, causing cracks to easily appear in the target blank during the rolling process, affecting the rolling quality of the target blank, causing the target blank to po...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Lengthaaaaaaaaaa
Widthaaaaaaaaaa
Heightaaaaaaaaaa
Login to View More

Abstract

The invention relates to a target rolling method. The target rolling method comprises the steps that a target blank is provided; the target blank is heated to a first temperature; after the target blank is heated to the first temperature, the target blank is calendered; during the calendering process, when the temperature of the target blank decreases to a second temperature, the target blank is heated, and the target blank is heated to the first temperature and then is calendered; and the heating treatment and the calendering treatment are carried out alternately until the target blank is manufactured into a target. According to the target rolling method, the target blank can be prevented from cracking during the calendering process, the rolling quality of the target can be improved, andthe sputtering performance of the target is improved.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a target rolling method. Background technique [0002] Sputtering coating is one of the processes for preparing thin films by physical vapor deposition. Specifically, it refers to the use of high-energy particles to bombard the surface of the target, so that the atoms or molecules of the target obtain enough energy to escape and deposit on the surface of the substrate or workpiece, thereby forming film. [0003] According to different applications, targets can be divided into targets for semiconductor applications, targets for recording media, targets for display films, optical targets, superconducting targets, etc. Among them, targets for semiconductor applications, targets for recording media and display targets are the three largest types of targets in the market. [0004] The target material is made of high-purity metal, and through forging, rolling, hea...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B21B3/00B21B45/00B21B1/06
CPCB21B1/026B21B1/06B21B3/00B21B45/004B21B2003/001
Inventor 姚力军潘杰王学泽陈金库
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com