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Regeneration cycle method of acidic etching solution

A technology of acid etching solution and acid etching waste solution, which is applied in photography process, instrument, photography auxiliary process, etc., can solve the problems of inability to meet the etching requirements, slow down the etching rate, etc., achieve simple and convenient system operation and maintenance, and avoid chlorine gas. The effect of leaking and ensuring safe use

Inactive Publication Date: 2019-07-05
GUANGZHOU JICHI ENVIRONMENTAL TECH CO LTD
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AI Technical Summary

Problems solved by technology

When the concentration of monovalent copper ions is too high in etching, the etching rate slows down and cannot meet the etching requirements

Method used

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  • Regeneration cycle method of acidic etching solution
  • Regeneration cycle method of acidic etching solution

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Embodiment Construction

[0029] The regeneration cycle device and method for the acidic etching solution provided by the present invention will be described in detail below.

[0030] A recycling device 10 for acidic etching solution includes an acidic etching line (DES) 100 , an etching waste liquid tank 200 and an electrolytic tank 300 connected in sequence, and the acidic etching line communicates with an acid mist absorption cylinder 400 . The etching waste liquid tank 200 collects the waste liquid generated by the acid etching line (DES) 100, and transports it to the electrolytic cell 300, and the electrolytic cell 300 electrolyzes the waste liquid, and converts copper ions in the waste liquid into electrolyzed Copper plate, while oxidizing the chlorine ions in the waste liquid to chlorine gas. The acid mist absorption cylinder 400 collects the waste liquid in the electrolytic cell 300 and reacts with chlorine gas to obtain a regenerated etching liquid.

[0031] The chlorine gas is produced in th...

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Abstract

The invention discloses a regeneration cycle method of an acidic etching solution. The regeneration cycle method comprises the following steps that S1, an acidic etching waste solution generated on anacidic etching line of a PCB is collected into an etching waste solution tank; S2, the waste solution in the etching waste solution tank is conveyed into an electrolytic cell, and copper ions in thewaste solution is precipitated to form electrolytic copper sheets through electrolysis action in a cathode region; S3, waste solution in an anode area of the electrolytic cell is conveyed to an acid mist absorption cylinder; S4, chlorine gas is conveyed into the waste liquid in the acid mist absorption cylinder, and an regenerated etching solution is prepared through the reaction with the chlorinegas; and S5, the regenerated etching solution in the acid mist absorption cylinder is conveyed to the acidic etching line (developing-etching-stripping (DES)) for being used in an etching process torealize the regeneration cycle of the acidic etching solution. According to the regeneration cycle method, the reuse rate of the regenerated etching solution can be enabled to reach to 100%, the addition of hydrochloric acid and an oxidant is reduced by about 80%, and the material cost is greatly reduced.

Description

technical field [0001] The invention relates to the technical field of waste liquid recovery, in particular to an acid etching liquid regeneration cycle method. Background technique [0002] Current electronic devices are mainly assembled from components soldered onto PCB boards (electronic printed circuit boards). A large amount of copper metal is used in the manufacturing process of these PCB boards. Advanced electronic equipment, such as computers, require PCB boards with very complex structures and corresponding production processes. These PCB boards are usually multi-layered, including inner and outer layers, and the inner layer is etched by an etching solution. [0003] Current PCB boards usually include a substrate made of plastic or laminate and a copper clad film deposited on the substrate. The conductive pattern, i.e. the layout, consists of a protective plastic film (photoresist) covering the surface of the copper clad film. During the etching process the plas...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/46C25C1/12C23F1/18
CPCC23F1/18C23F1/46C25C1/12Y02P10/20
Inventor 罗宝奎陈永江
Owner GUANGZHOU JICHI ENVIRONMENTAL TECH CO LTD
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