Temperature-graded magnetic heating material and preparation method thereof
A technology of magnetocaloric materials and phase transition temperature, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of narrow working temperature range, difficulty in ensuring high magnetic refrigeration performance and efficiency of materials, and achieve Improve the magneto-caloric effect, expand the working temperature area, and reduce the cost
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Embodiment 1
[0019] Embodiment 1: step 1): with SiO 2 The substrate was ultrasonically cleaned with acetone, absolute ethanol and deionized water for 5 minutes each, and then dried with nitrogen gas for later use. With Ni 50 mn 37 sn 13 The alloy is used as the target material, and the radio frequency magnetron sputtering technology is used on SiO 2 15 μm thick Ni was prepared on the substrate 50 mn 37 sn 13 film. The alloy target for sputtering is a cylindrical target with a diameter of 60 mm and a thickness of 2-3 mm, and the distance from the target to the substrate is 70 mm. During the sputtering process, the substrate was rotated at a speed of 10rpm to ensure the uniformity of the sample. The sputtering gas was high-purity argon (99.999%), the working pressure was 0.5Pa, and the sputtering power was 150W.
[0020] Step 2): Take out Ni 50 mn 37 sn 13 Thin film sample, put it into a quartz glass tube to vacuum, the vacuum degree is less than 10 -3 Pa. Put the quartz glass t...
Embodiment 2
[0024] This embodiment is compared with embodiment one, except Ni 50 mn 37 sn 13 / Ni 50 mn 35 In 15 Except that the thickness ratio of the two components in the structure is 30 μm:30 μm, other steps are the same as in Example 1.
Embodiment 3
[0026] This embodiment is compared with embodiment one, except Ni 50 mn 37 sn 13 / Ni 50 mn 35 In 15 Except that the thickness ratio of the two components in the structure is 45 μm:15 μm, other steps are the same as in Example 1.
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