An inorganic-organic/inorganic hybrid double-layer nano-film memristor simulating neural synapses and its preparation method
A technology of neural synapses and nano-films, which is applied in semiconductor/solid-state device manufacturing, nanotechnology for information processing, nanotechnology, etc., to achieve the effect of easy design and processing
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Embodiment 1
[0025] An inorganic-organic / inorganic hybrid double-layer nano-film memristor simulating neural synapses, comprising a substrate, a bottom electrode, a memristive functional layer, and a top electrode from bottom to top; the memristive functional layer consists of The lower inorganic-organic hybrid thin film and the upper metal oxide thin film are composed of a double-layer nano-stack structure thin film material.
[0026] This embodiment is an inorganic-organic / inorganic hybrid double-layer nano-film memristor-Pt / TiO 2 / Ti-based maleic acid / TaN / SiO 2 / Si memristor fabrication process. The tantalum nitride prepared by magnetron sputtering was used as the bottom electrode, the binary unsaturated carboxylic acid-maleic acid was used as the organic precursor, and titanium tetrachloride was used as the inorganic precursor, and the titanium base was prepared by molecular layer deposition (MLD). Maleic acid inorganic-organic hybrid nano film; using titanium tetrachloride (TiCl 4 ...
Embodiment 2
[0037] An inorganic-organic / inorganic hybrid double-layer nano-film memristor simulating neural synapses, comprising a substrate, a bottom electrode, a memristive functional layer, and a top electrode from bottom to top; the memristive functional layer consists of The lower inorganic-organic hybrid thin film and the upper metal oxide thin film are composed of a double-layer nano-stack structure thin film material.
[0038] This embodiment is an inorganic-organic / inorganic hybrid double-layer nano-film memristor-Pt / ZnO / Zn-based succinic acid / TiN / SrTiO 3 Fabrication process of memristors. Titanium nitride prepared by plasma-enhanced ALD (PEALD) process is used as the bottom electrode, dibasic saturated carboxylic acid-succinic acid is used as the organic precursor, diethyl zinc is used as the inorganic precursor, and molecular layer deposition (MLD) is used. Zinc-based succinic acid inorganic-organic hybrid nanofilm; using diethylzinc and deionized water (H 2 O) as precursor, ...
Embodiment 3
[0043] An inorganic-organic / inorganic hybrid double-layer nano-film memristor simulating neural synapses, comprising a substrate, a bottom electrode, a memristive functional layer, and a top electrode from bottom to top; the memristive functional layer consists of The lower inorganic-organic hybrid thin film and the upper metal oxide thin film are composed of a double-layer nano-stack structure thin film material.
[0044] This embodiment is an inorganic-organic / inorganic hybrid double-layer nano-film memristor-Au / Al 2 o 3 / Ti-based glutaconic acid / TiN / PI memristor preparation process. Titanium nitride prepared by magnetron sputtering was used as the bottom electrode, binary unsaturated carboxylic acid-glutaconic acid was used as the organic precursor, titanium tetrachloride was used as the inorganic precursor, and molecular layer deposition (MLD) was used to prepare titanium Based glutaconic acid inorganic-organic hybrid nano film; using trimethylaluminum (Al(CH 3 ) 3 ) a...
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