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Apparatus and method for monitoring substrate processing

A substrate processing and substrate technology, applied in hardware monitoring, electrical program control, comprehensive factory control, etc., can solve problems such as changes in analysis results

Active Publication Date: 2022-07-22
SEMES CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, it takes a lot of time to find out the cause of the problem, and the analysis results may vary depending on the operator's proficiency or understanding of the substrate processing equipment

Method used

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  • Apparatus and method for monitoring substrate processing
  • Apparatus and method for monitoring substrate processing
  • Apparatus and method for monitoring substrate processing

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Embodiment Construction

[0041] Hereinafter, embodiments of the inventive concept will be described in detail with reference to the accompanying drawings.

[0042] figure 1 to illustrate a schematic block diagram of a substrate processing system 10 according to an embodiment of the present inventive concept.

[0043] like figure 1 As shown, the substrate processing system 10 may include: a substrate processing apparatus 100 , a substrate processing monitoring apparatus 200 , and a display apparatus 410 .

[0044] The substrate processing apparatus 100 may process substrates and may include one or more modules required to perform substrate processing.

[0045] figure 2 It is a plan view illustrating a structure of a substrate processing apparatus 100 according to an embodiment of the present inventive concept.

[0046] like figure 2 As shown, substrate processing apparatus 100 may include one or more modules and may perform substrate processing. For example, where the substrate processing apparat...

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Abstract

An apparatus for monitoring substrate processing is disclosed, the apparatus comprising: a process data acquisition unit configured to acquire process data related to substrate processing from a substrate processing equipment; a storage unit configured to store information about a substrate processing equipment configured to match The screen configuration data of the process monitoring screen of the layout; the processing unit, which is configured to import the screen configuration data, and run the process monitoring screen according to the process data; Tap to output process data values ​​on the Process Monitor screen.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS [0002] This application claims priority to and the benefit of Korean Patent Application No. 10-2017-0140253, filed with the Korea Industrial Property Office on October 26, 2017, the entire contents of which are incorporated herein by reference. technical field [0003] Embodiments of the inventive concept described herein relate to an apparatus and method for monitoring substrate processing, and more particularly, to a substrate processing monitoring apparatus and method for outputting process data at a specific point in time. Background technique [0004] Substrate processing, such as forming circuit patterns on a substrate (eg, silicon wafer or glass), is performed by substrate processing equipment designed to meet substrate processing requirements. Substrate processing equipment includes different modules required to process substrates. [0005] For example, in the case where a substrate processing apparatus performs a pho...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F11/32G06F11/30
CPCH01L21/67276H01L21/67288H01L21/67242H01L21/02H01L21/67253H01L22/12G05B19/418G06F18/24
Inventor 郑荣勋金珍焕
Owner SEMES CO LTD
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