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Apparatus and method for monitoring substrate processing

A substrate processing and substrate technology, applied in hardware monitoring, electrical program control, comprehensive factory control, etc., can solve problems such as changes in analysis results

Active Publication Date: 2019-05-03
SEMES CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it takes a lot of time to find out the cause of the problem, and the analysis results may vary depending on the operator's proficiency or understanding of the substrate processing equipment

Method used

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  • Apparatus and method for monitoring substrate processing
  • Apparatus and method for monitoring substrate processing
  • Apparatus and method for monitoring substrate processing

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Embodiment Construction

[0041] Hereinafter, embodiments of the inventive concept will be described in detail with reference to the accompanying drawings.

[0042] figure 1 is a schematic block diagram illustrating a substrate processing system 10 according to an embodiment of the inventive concept.

[0043] Such as figure 1 As shown, the substrate processing system 10 may include: a substrate processing equipment 100 , a substrate processing monitoring device 200 , and a display device 410 .

[0044] The substrate processing apparatus 100 may process a substrate, and may include one or more modules required to perform substrate processing.

[0045] figure 2 is a plan view illustrating a structure of a substrate processing apparatus 100 according to an embodiment of the inventive concept.

[0046] Such as figure 2 As shown, the substrate processing apparatus 100 may include one or more modules, and may perform substrate processing. For example, in the case where the substrate processing apparatu...

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Abstract

Disclosed is an apparatus for monitoring substrate processing, the apparatus including a process data acquisition unit that acquires process data regarding the substrate processing from substrate processing equipment, a storage unit that stores screen configuration data regarding a process monitoring screen that is configured to match a layout of the substrate processing equipment, a processing unit that imports the screen configuration data and operates the process monitoring screen according to the process data, and a control unit that classifies the process data according to time points andoutputs a process data value at a specific time point on the process monitoring screen.

Description

[0001] Cross References to Related Applications [0002] This application claims priority and benefit from Korean Patent Application No. 10-2017-0140253 filed with the Korean Industrial Property Office on October 26, 2017, the entire contents of which are incorporated herein by reference. technical field [0003] Embodiments of the inventive concepts described herein relate to an apparatus and method for monitoring substrate processing, and more particularly, to a substrate processing monitoring apparatus and method for outputting process data at a specific time point. Background technique [0004] Substrate processing such as forming circuit patterns on a substrate (eg, silicon wafer or glass) is performed by substrate processing equipment designed to meet substrate processing requirements. Substrate processing equipment includes the different modules required to process substrates. [0005] For example, in the case where a substrate processing apparatus performs a photoli...

Claims

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Application Information

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IPC IPC(8): G06F11/32G06F11/30
CPCH01L21/67276H01L21/67288H01L21/67242H01L21/02H01L21/67253H01L22/12G05B19/418G06F18/24
Inventor 郑荣勋金珍焕
Owner SEMES CO LTD
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