Film system structure of ultra-wide-angle laser and long-wave infrared dual-band high-strength antireflection film
An anti-reflection coating, long-wave infrared technology, applied in optics, optical components, instruments, etc., can solve the problems of inability to withstand environmental tests such as sand dust, salt spray, damp heat, temperature shock, and low index requirements
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Embodiment 1
[0045] In this embodiment, the film system structure of the 1.064 μm laser incident on the ZnS substrate at an ultra-wide angle of 0° to 76° and the 7.5 μm to 10.0 μm long-wave infrared dual-band high-strength anti-reflection film consists of a zinc sulfide substrate and an anti-reflection film system. composition. The anti-reflection film system is composed of four layers of thin film materials. Wherein, the first film layer from inside to outside is hafnium oxide, which is plated on the surface of the zinc sulfide substrate; the second film layer is zinc sulfide, which is plated on the first film layer; the third film layer is Ytterbium fluoride is plated on the second film layer; the fourth film layer is zinc sulfide, and is plated on the third film layer, ..., the zinc sulfide film layer and the ytterbium fluoride film layer alternate to The eighteenth film layer; the nineteenth film layer is silicon nitride plated on the eighteenth film layer. That is, the number of lay...
Embodiment 2
[0052] The substrate adopts multi-spectral zinc sulfide, and the anti-reflection film system is composed of four layers of film materials. Wherein, the first film layer from inside to outside is hafnium oxide, which is plated on the surface of the zinc sulfide substrate; the second film layer is zinc sulfide, which is plated on the first film layer; the third film layer is Ytterbium fluoride is plated on the second film layer; the fourth film layer is zinc sulfide, and is plated on the third film layer, ..., the zinc sulfide film layer and the ytterbium fluoride film layer alternate to The eighteenth film layer; the nineteenth film layer is silicon nitride plated on the eighteenth film layer. That is, the number of layers of the anti-reflection film system is 19 layers in total, the first layer is a hafnium oxide film layer, the odd-numbered layers from the second layer to the 18th layer are ytterbium fluoride film layers, and the even-numbered layers are zinc sulfide film lay...
Embodiment 3
[0058] The substrate adopts multi-spectral zinc sulfide, and the anti-reflection film system is composed of four layers of film materials. Wherein, the first film layer from inside to outside is hafnium oxide, which is plated on the surface of the zinc sulfide substrate; the second film layer is zinc sulfide, which is plated on the first film layer; the third film layer is Ytterbium fluoride is plated on the second film layer; the fourth film layer is zinc sulfide, and is plated on the third film layer, ..., the zinc sulfide film layer and the ytterbium fluoride film layer alternate to The eighteenth film layer; the nineteenth film layer is silicon nitride plated on the eighteenth film layer. That is, the number of layers of the anti-reflection film system is 19 layers in total, the first layer is a hafnium oxide film layer, the odd-numbered layers from the second layer to the 18th layer are ytterbium fluoride film layers, and the even-numbered layers are zinc sulfide film lay...
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