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Film system structure of ultra-wide-angle laser and long-wave infrared dual-band high-strength antireflection film

An anti-reflection coating, long-wave infrared technology, applied in optics, optical components, instruments, etc., can solve the problems of inability to withstand environmental tests such as sand dust, salt spray, damp heat, temperature shock, and low index requirements

Active Publication Date: 2019-04-30
西安应用光学研究所
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

ZnS and YbF3 are commonly used materials in infrared thin film materials, and have low absorption in the working band, but both materials are "soft materials", which cannot withstand the sand, dust, salt spray, humidity, and temperature in the national military standard GJB 150-2009. Impact and other environmental tests; the incident angle range in the patent is much smaller, and the index requirements are relatively low

Method used

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  • Film system structure of ultra-wide-angle laser and long-wave infrared dual-band high-strength antireflection film
  • Film system structure of ultra-wide-angle laser and long-wave infrared dual-band high-strength antireflection film
  • Film system structure of ultra-wide-angle laser and long-wave infrared dual-band high-strength antireflection film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] In this embodiment, the film system structure of the 1.064 μm laser incident on the ZnS substrate at an ultra-wide angle of 0° to 76° and the 7.5 μm to 10.0 μm long-wave infrared dual-band high-strength anti-reflection film consists of a zinc sulfide substrate and an anti-reflection film system. composition. The anti-reflection film system is composed of four layers of thin film materials. Wherein, the first film layer from inside to outside is hafnium oxide, which is plated on the surface of the zinc sulfide substrate; the second film layer is zinc sulfide, which is plated on the first film layer; the third film layer is Ytterbium fluoride is plated on the second film layer; the fourth film layer is zinc sulfide, and is plated on the third film layer, ..., the zinc sulfide film layer and the ytterbium fluoride film layer alternate to The eighteenth film layer; the nineteenth film layer is silicon nitride plated on the eighteenth film layer. That is, the number of lay...

Embodiment 2

[0052] The substrate adopts multi-spectral zinc sulfide, and the anti-reflection film system is composed of four layers of film materials. Wherein, the first film layer from inside to outside is hafnium oxide, which is plated on the surface of the zinc sulfide substrate; the second film layer is zinc sulfide, which is plated on the first film layer; the third film layer is Ytterbium fluoride is plated on the second film layer; the fourth film layer is zinc sulfide, and is plated on the third film layer, ..., the zinc sulfide film layer and the ytterbium fluoride film layer alternate to The eighteenth film layer; the nineteenth film layer is silicon nitride plated on the eighteenth film layer. That is, the number of layers of the anti-reflection film system is 19 layers in total, the first layer is a hafnium oxide film layer, the odd-numbered layers from the second layer to the 18th layer are ytterbium fluoride film layers, and the even-numbered layers are zinc sulfide film lay...

Embodiment 3

[0058] The substrate adopts multi-spectral zinc sulfide, and the anti-reflection film system is composed of four layers of film materials. Wherein, the first film layer from inside to outside is hafnium oxide, which is plated on the surface of the zinc sulfide substrate; the second film layer is zinc sulfide, which is plated on the first film layer; the third film layer is Ytterbium fluoride is plated on the second film layer; the fourth film layer is zinc sulfide, and is plated on the third film layer, ..., the zinc sulfide film layer and the ytterbium fluoride film layer alternate to The eighteenth film layer; the nineteenth film layer is silicon nitride plated on the eighteenth film layer. That is, the number of layers of the anti-reflection film system is 19 layers in total, the first layer is a hafnium oxide film layer, the odd-numbered layers from the second layer to the 18th layer are ytterbium fluoride film layers, and the even-numbered layers are zinc sulfide film lay...

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Abstract

The invention provides a film system structure of an ultra-wide-angle laser and long-wave infrared dual-band high-strength antireflection film. The film system structure is composed of a zinc sulfidesubstrate and an antireflection film system. The antireflection film system is formed by superposing film layers prepared from four thin film materials, wherein the total number of the film layers is19, and, from the zinc sulfide substrate, the first layer is hafnium oxide, odd layers from the second layer to the eighteenth layer are ytterbium fluoride film layers, even layers are zinc sulfide film layers, and the nineteenth layer is a silicon nitride film layer. According to the invention, high transmission of 1.064 [mu]m laser and 7.5-10.0 [mu]m long-wave infrared rays in an ultra-wide angle range of 0-76 degrees can be realized; the film layers are firm and high strength is achieved; the structure can pass severe environment tests such as wind tunnels, sand dust, raining, salt mist, damp heat, temperature impact and the like in national military standard GJB 150-2009; the structure can meet the application requirements of multi-spectral zinc sulfide optical windows of radar stealthhigh-speed weapon platforms and can be applied to stealth optical windows of multi-band common-optical-path optical systems of stealth airborne and stealth ship-based high-speed weapon platforms.

Description

technical field [0001] The invention belongs to the technical field of optical thin films, and specifically relates to a film system structure of ultra-wide-angle laser and long-wave infrared dual-band high-strength anti-reflection film. Background technique [0002] With the rapid development of modern advanced military optical systems, its operating distance is getting farther and higher, and its accuracy is getting higher and higher. Getting harsher. Especially the optical window of the airborne optoelectronic system, when the aircraft is flying at high speed, the window will be subjected to high-speed impacts such as raindrops, sand, flying insects and even hail. If the surface of the optical window is damaged or damaged, it will affect the operating distance and accuracy of the entire photoelectric system, or even completely paralyze the entire photoelectric system. The multi-spectral zinc sulfide optical window of the radar stealth high-speed weapon platform with inf...

Claims

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Application Information

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IPC IPC(8): G02B1/115G02B1/14
CPCG02B1/115G02B1/14
Inventor 张建付陶忠昌明杨崇民刘永强李明伟米高园王松林师建涛刘青龙王颖辉陈朝平郭鸿香
Owner 西安应用光学研究所
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