Double-protection ring and forming method thereof
A double protection and protection ring technology, applied in electrical components, circuits, semiconductor devices, etc., can solve the problem that the effect of suppressing the latch-up effect needs to be improved.
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[0028] As mentioned in the background art, the suppression effect of the existing guard ring on the latch-up effect still needs to be improved.
[0029] Research has found that the junction depth of the existing guard ring is shallow, and its ability to absorb substrate charges is limited, so that the guard ring has a limited suppression effect on the latch-up effect. Although the suppression effect can be enhanced by increasing the number of guard rings, too many guard rings will increase the area of the chip and noises will crosstalk each other.
[0030] To this end, an embodiment of the present invention provides a guard ring and a method for forming the guard ring. In the guard ring formation method, an N-type second guard ring is formed in a P-type substrate, and the N-type second guard ring is formed in a P-type substrate. The guard ring includes an N-type first well region and an N-type second well region deeper than the N-type first well region, so that the N-type se...
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