Silicon wafer cleaning underwater insertion device

A silicon wafer cleaning and silicon wafer technology, used in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as misoperation and scratching silicon wafers, avoid low efficiency, improve automation, and shorten working time. Effect

Pending Publication Date: 2019-03-29
TIANJIN ZHONGHUAN ADVANCED MATERIAL TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Artificially inserting the basket in the water will cause scratches on silicon wafers and even misuse

Method used

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  • Silicon wafer cleaning underwater insertion device
  • Silicon wafer cleaning underwater insertion device
  • Silicon wafer cleaning underwater insertion device

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Embodiment Construction

[0028] It should be noted that, in the case of no conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other.

[0029] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", " The orientations or positional relationships indicated by "vertical", "horizontal", "top", "bottom", "inner" and "outer" are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and Simplified descriptions, rather than indicating or implying that the device or element referred to must have a particular orientation, be constructed and operate in a particular orientation, and thus should not be construed as limiting the invention. In addition, the terms "first", "second", etc. are used for descriptive purposes only, and should not be understood ...

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PUM

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Abstract

The invention provides a silicon wafer cleaning underwater insertion device, comprising a water tank, mobile suction devices, a silicon wafer moving device and a nozzle, wherein the mobile suction devices are fixedly mounted on both sides of the water tank; the silicon wafer moving device can hold a silicon wafer and is arranged in the water tank to reciprocate; the nozzle is located under the silicon wafer moving device; each moving suction device comprises an xyz module and a vacuum suction cup; the vacuum suction cup is arranged on the xyz module and moves in the xyz direction under the driving of the xyz module; and the vacuum suction cup removes the cleaned silicon wafer from the silicon wafer moving device. The silicon wafer cleaning underwater insertion device of the invention can enable the vacuum suction cup moving device to underwater insert wafers into collection boxes at the two ends of the water tank, avoids the disadvantages such as low efficiency, high error rate, easy scratching of the silicon wafer and the like of manual insertion, thereby improving automation degree, shortening working hours and solving labor costs.

Description

technical field [0001] The invention belongs to the technical field of cleaning equipment, and in particular relates to a device for inserting baskets in silicon wafer cleaning water. Background technique [0002] In the field of semiconductor silicon single crystal manufacturing, manually inserting silicon wafers into baskets will directly affect product quality. Artificially inserting the basket in the water will cause scratches on the silicon wafers and even misuse. The use of automatic basket insertion equipment for silicon wafers in water can reduce artificial scratches on silicon wafers and misoperation, and improve the degree of automation. It can be seen that the underwater basket insertion equipment can realize the timeliness and accuracy of transferring silicon wafers, and at the same time reduce labor costs, save manpower, and improve the production efficiency of the workshop. Contents of the invention [0003] In view of this, the present invention aims to pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/683H01L21/687
CPCH01L21/67051H01L21/6838H01L21/68764
Inventor 韩木迪张淳戴超齐风李笑岩
Owner TIANJIN ZHONGHUAN ADVANCED MATERIAL TECH
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