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High-performance vacuum anti-reflection film and preparation method thereof

An anti-reflection coating and high-performance technology, applied in the field of optical materials, can solve the problems of poor transmission performance and poor weather resistance of the anti-reflection coating, and achieve the effect of improving anti-pollution ability, weather resistance and high anti-pollution ability.

Active Publication Date: 2019-03-01
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide a high-performance vacuum anti-reflection film and its preparation method to solve the problems of poor weather resistance and poor transmission performance of the existing anti-reflection film

Method used

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  • High-performance vacuum anti-reflection film and preparation method thereof

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Embodiment 1

[0027] The preparation method of the high-performance vacuum anti-reflection film of the present embodiment comprises the following steps:

[0028] (1) Mix tetraethyl orthosilicate, perfluorotriglyme, catalyst and organic solvent uniformly in a mass ratio of 2:5:0.5:20 and age at 20°C for 16 days to obtain Modified SiO 2 a first sol of porous particles;

[0029] (2) Dissolve the poly-n-butyl methacrylate block polymer in a mixed solution of acetone and sec-butanol by ultrasonic solubilization to prepare a filling solution with a concentration of 0.078g / mL; wherein, acetone and sec-butanol The mass ratio is 1:1; ultrasonic conditions include: ultrasonic frequency 15kHz, ultrasonic power 500W, ultrasonic time 5min;

[0030] (3) According to the fact that poly-n-butyl methacrylate accounts for 3% of the mass of tetraethyl orthosilicate, the filling solution is added to the first sol and stirred for 4 hours to obtain the second sol;

[0031] (4) The second sol was coated on the...

Embodiment 2

[0035] The preparation method of the high-performance vacuum anti-reflection film of the present embodiment comprises the following steps:

[0036] (1) Mix tetraethyl orthosilicate, perfluorotriglyme, catalyst and organic solvent in a mass ratio of 3.5:6:1:30 and age at 25°C for 14 days to obtain Modified SiO 2 a first sol of porous particles;

[0037] (2) Dissolve the poly-n-butyl methacrylate block polymer in a mixed solution of acetone and sec-butanol by ultrasonic solubilization to prepare a filling solution with a concentration of 0.192g / mL; wherein, acetone and sec-butanol The mass ratio is 1:1.5; ultrasonic conditions include: ultrasonic frequency 20kHz, ultrasonic power 470W, ultrasonic time 8min;

[0038] (3) According to the fact that poly-n-butyl methacrylate accounts for 4% of the mass of tetraethyl orthosilicate, the filling solution is added to the first sol and stirred for 6 hours to obtain the second sol;

[0039] (4) Coating the second sol on the cleaned su...

Embodiment 3

[0043] The preparation method of the high-performance vacuum anti-reflection film of the present embodiment comprises the following steps:

[0044] (1) Mix tetraethyl orthosilicate, perfluorotriglyme, catalyst and organic solvent in a mass ratio of 5:7:1.5:40 and age at 30°C for 12 days to obtain Modified SiO 2 a first sol of porous particles;

[0045] (2) Dissolve the poly-n-butyl methacrylate block polymer in a mixed solution of acetone and sec-butanol by ultrasonic solubilization to prepare a filling solution with a concentration of 0.375g / mL; wherein, acetone and sec-butanol The mass ratio is 1:2; ultrasonic conditions include: ultrasonic frequency 25kHz, ultrasonic power 450W, ultrasonic time 10min;

[0046](3) According to the fact that poly-n-butyl methacrylate accounts for 5% of the mass of tetraethyl orthosilicate, the filling solution is added to the first sol and stirred for 8 hours to obtain the second sol;

[0047] (4) The second sol was coated on the cleaned s...

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Abstract

The invention discloses a high-performance vacuum anti-reflection film and a preparation method thereof, and belongs to the technical field of optical materials. According to the high-performance vacuum anti-reflection film and the preparation method thereof, tetraethyl orthosilicate and a modifier perfluorotriglycol dimethyl ether are reacted to obtain first sol, a dissolved poly(n-butyl methacrylate) block polymer is added into the first sol for reaction to obtain second sol, and the second sol is used for film-forming, so that the vacuum anti-reflection film is prepared. The vacuum anti-reflection film has low surface free energy, is not liable to adsorb pollutants of water vapor and the like, and has high transmittance (>99%) in a wave band of ultraviolet laser (at a wavelength of about 351 nm), high-energy output of third harmonic generation laser in a high-power laser device can be achieved, and the transmittance basically remains unchanged after the high-performance vacuum anti-reflection film is placed in a vacuum environment for several days.

Description

technical field [0001] The invention relates to the technical field of optical materials, in particular to a high-performance vacuum antireflection film and a preparation method thereof. Background technique [0002] The sol-gel chemical coating method is widely used in the thin film preparation of components in high-power lasers due to its advantages of simple preparation process, low cost, good uniformity of large-area film formation, and high resistance to laser damage threshold. High-power lasers, especially ultraviolet lasers, must be operated in a vacuum device to ensure that their beam quality and transmission energy are not affected, but substances that increase sealing properties such as vacuum esters used in vacuum devices are also more volatile and adhere to the surface of the component, resulting in its Performance degradation or even complete failure. Therefore, making the film layer have a weather resistance function in the vacuum device can improve the qualit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L53/00C08K9/04C08K7/26C08J5/18
CPCC08J5/18C08J2353/00C08K7/26C08K9/04
Inventor 张清华邓雪然杨伟卫耀伟雷向阳惠浩浩马红菊王梓龙张剑锋周炼
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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