A method for manufacturing fine lines of a flexible circuit board
A technology of flexible circuit boards and fine circuits, which is applied in the fields of printed circuit manufacturing, printed circuits, and removal of conductive materials by chemical/electrolytic methods. It can solve problems such as poor functionality, improve analytical capabilities, and reduce pool effects. the effect of the influence
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Embodiment 1
[0025] A method for manufacturing a fine circuit of a flexible circuit board, comprising the following steps:
[0026] S1. Use thin copper material and cut it: the thickness of the selected copper material is 3 μm;
[0027] S2.UV laser drilling;
[0028] S3. Removing glue residue;
[0029] S4. Black hole: before the black hole, first conduct plasma treatment, and then black hole;
[0030] S5. Electroplating copper: The thickness of copper on the surface of VCP electroplating wire is 1.5 μm of that of Longmen wire, and the COV value is 4.2% of that of Longmen wire.
[0031] S6. Film exposure and development: In step S6, the thickness of the photosensitive film used is 15 μm, the photosensitive film is a wet film, and the minimum line spacing of the resolution capability of the wet film is 16 μm.
[0032] S7. Vacuum etching: During the etching process, the spray pressure is 2.4 Kg / cm 2 , The lower pressure is 2.2Kg / cm 2 , the etching speed is between 4.5m / min;
[0033] S8....
Embodiment 2
[0038] A method for manufacturing a fine circuit of a flexible circuit board, comprising the following steps:
[0039] S1. Use thin copper material and cut it: the thickness of the selected copper material is 1 μm;
[0040] S2.UV laser drilling;
[0041] S3. Removing glue residue;
[0042] S4. Black hole: before the black hole, first conduct plasma treatment, and then black hole;
[0043] S5. Electroplating copper: the thickness of copper on the surface of the VCP electroplating line is 1 μm of the Longmen line, and the COV value is 3% of the Longmen line;
[0044] S6. Film exposure and development: the thickness of the photosensitive film used is 10 μm, the photosensitive film is a wet film, and the minimum line spacing of the wet film is 10 μm;
[0045] S7. Vacuum etching: During the etching process, the spray pressure is 2.4 Kg / cm 2, The lower pressure is 2.2Kg / cm 2 , the etching speed is between 3.0m / min;
[0046] S8. Withdraw the film.
[0047] Further, in step S6,...
Embodiment 3
[0051] A method for manufacturing a fine circuit of a flexible circuit board, comprising the following steps:
[0052] S1. Use thin copper material and cut it: the thickness of the selected copper material is 9 μm;
[0053] S2.UV laser drilling;
[0054] S3. Removing glue residue;
[0055] S4. Black hole: before the black hole, first conduct plasma treatment, and then black hole;
[0056] S5. Electroplating copper: the copper thickness of the surface of VCP electroplating wire is 5 μm of that of Longmen wire, and the COV value is 3-15% of that of Longmen wire;
[0057] S6. Film exposure and development: the thickness of the photosensitive film used is 20 μm, the photosensitive film is a wet film, and the minimum line spacing of the wet film is 20 μm;
[0058] S7. Vacuum etching: During the etching process, the spray pressure is 2.4 Kg / cm 2 , The lower pressure is 2.2Kg / cm 2 , the etching speed is between 5.5m / min;
[0059] S8. Withdraw the film.
[0060] Further, in ste...
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