A preparation method of patterned graphene flexible strain sensor

Abstract

The invention provides a preparation method of a patterned graphene flexible strain sensor. The method comprises the following steps: firstly, preparing a predetermined pattern on the surface of a hard substrate material by using photoetching to obtain a patterned mold, and then pouring mixed slurry of polymer material elastomer and a curing agent onto the surface of the patterned mold for curingto obtain a micro-channel mold; and then covering the surface of a flexible substrate with the micro-channel mold, performing patterned modification on the flexible substrate by using dopamine, preparing a graphene sensitive layer on the surface of the modified substrate, and finally coating conductive silver paste and bonding a conducting wire to obtain the patterned graphene flexible strain sensor. According to the preparation method provided by the invention, no photoetching needs to be performed on the flexible substrate, so that the main body structure of the flexible substrate is not damaged, the preparation method is suitable for complex curved surfaces, large-area manufacturing and fine pattern processing, and the requirements for the own material, the shape and the surface structure of the flexible substrate are reduced.

Description

technical field [0001] The invention relates to the technical field of sensors, in particular to a method for preparing a patterned graphene flexible strain sensor. Background technique [0002] Graphene patterned film formation has important application value for the fine processing and performance regulation of micro-nano devices, and has aroused extensive research interest. The traditional graphene patterning method is to spin-coat graphene oxide on the surface of the substrate, and then perform photolithography to form a pattern, and then reduce the patterned graphene oxide. This method requires a photolithography step, which is cumbersome and costly, will cause certain damage to the substrate surface, and has strict requirements on the substrate material and surface morphology. And when the spin-coating process drops the graphene oxide reagent on the rotating substrate, the interaction force between graphene oxide and the substrate will affect the film formation, and t...

AI Technical Summary

Problems solved by technology

Among them, the inkjet printing process has a serious coffee ring effect (referring to the phenomenon that a ring-shaped stain is sometimes formed on the edge of the droplet after the solution or suspension droplet evaporates on the solid surface), and the graphene solution is formed into a film. It will cause the uniformity of graphene oxide film to decrease, and the existence of coffee ring will reduce the pattern resolution, which hinders the realization of micro-nano level patterning process of graphene film.

The graphene ink used in the screen printing process is generally a slurry with a high viscosity, and the introduction of adhesives limits the conductivity of graphene.

[0004] Therefore, the current methods for preparing patterned graphene sensors in this field are cumbersome, difficult to control, and cannot adapt to complex curved surfaces, and cannot process fine patterns, which hinders the development of flexible strain sensors.

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