SPR neural synaptic device based on a-SiOx memristor effect and preparation method thereof
A technology of neural synapse and memristor, which is applied in the field of bionic devices, can solve the problems of small signal processing bandwidth and signal transmission crosstalk, and achieve the effect of large signal processing bandwidth, large bandwidth, and avoiding grazing incidence
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Embodiment 1
[0035] A SPR neurosynaptic device based on a-SiOx memristive effect, its structure is as follows figure 1 Shown: including a memristor and a K9 glass prism 6 arranged above the memristor. In this embodiment, the K9 glass prism 6 is a triangular prism processed from K9 optical glass, and the memristor is bottom-up With "bottom electrode 1 / first a-SiO x Resistive switch layer 2 / second a-SiO x Resistive variable layer 3 / top electrode 4" vertical four-layer structure, in this embodiment the top electrode 4 is metal silver Ag deposited on the bottom surface of K9 glass prism 6, the second a-SiO x The resistive layer 3 is a-SiO containing Ag nanoparticles x thin film with a volume fraction of Ag nanoparticles of 40%, the first a-SiO x The resistive switch layer 2 is a-SiO containing Ag nanoparticles x film, whose volume fraction of Ag nanoparticles is 5%, and the bottom electrode 1 is deposited on the first a-SiO x The metal platinum Pt on the bottom surface of the resistive la...
Embodiment 2
[0044] A based on a-SiO x SPR neurosynaptic device with memristive effect, its structure is as follows figure 1 Shown: comprise memristor and be arranged on the K9 glass substrate 5 above described memristor and be arranged on the K9 glass prism 6 above described K9 glass substrate 5, in the present embodiment, K9 glass prism 6 is made of K9 The triangular prism processed from optical glass, the K9 glass substrate 5 is also processed from K9 optical glass, the K9 glass substrate 5 and the K9 glass prism 6 are preferably bonded with a refractive index matching liquid; while the upper has "bottom electrode 1 / first a-SiO x Resistive switch layer 2 / second a-SiO x Resistive variable layer 3 / top electrode 4" vertical four-layer structure. In this embodiment, the top electrode 4 is metal silver Ag deposited on the bottom surface of the crystalline silicon prism 6, and the second a-SiO x The resistive layer 3 is a-SiO containing Ag nanoparticles x thin film with a volume fraction ...
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