Preparation method of red phosphorus-zinc oxide heterojunction film for rapid photocatalytic sterilization

A photocatalysis, zinc oxide technology, applied in photocatalysis, semiconductor heterojunction, can solve the problems of limited activity, low charge separation efficiency, poor photocatalytic efficiency of ZnO, etc., to achieve rapid antibacterial properties, low implementation difficulty, and excellent antibacterial effect. Effect

Active Publication Date: 2020-05-08
HUBEI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the wide bandgap of ZnO limits its activity in the visible region of the solar spectrum
In addition, the photocatalytic efficiency of ZnO is poor due to the easy recombination of photogenerated electrons and holes of single-component photocatalysts, low charge separation efficiency and fast recombination of charge carriers.

Method used

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  • Preparation method of red phosphorus-zinc oxide heterojunction film for rapid photocatalytic sterilization
  • Preparation method of red phosphorus-zinc oxide heterojunction film for rapid photocatalytic sterilization
  • Preparation method of red phosphorus-zinc oxide heterojunction film for rapid photocatalytic sterilization

Examples

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Comparison scheme
Effect test

Embodiment 1

[0039] Step 1, mechanical polishing of titanium sheet

[0040] Use 240 and 800 mesh emery on the polishing machine to polish the titanium sheet in turn until the surface is smooth, then place the polished titanium sheet in acetone, absolute ethanol and deionized water for 15 minutes, and then dry it naturally at room temperature for later use;

[0041] Step 2, preparation of red phosphorus film

[0042] The polished titanium sheet obtained in step 1 is used as a substrate, and a uniform red phosphorus film is plated by chemical vapor deposition (CVD). The specific steps are:

[0043] 1) Put the red phosphorus powder at 200°C, hydrothermally treat it for 12 hours, slowly lower it to room temperature, and grind it to a uniform powder below 100 microns after vacuum drying;

[0044] 2) Put the pretreated red phosphorus and titanium sheets in a CVD furnace, first pass argon gas at a rate of 2 sccm, then raise the temperature to 650 °C at a rate of 10 °C / min, and keep it for 5 hour...

Embodiment 2

[0049] Step 1: Mechanical polishing of titanium sheet

[0050] Polish the titanium sheet with 240 and 800 mesh emery on the polishing machine in turn, until the surface is smooth, then place the polished titanium sheet in acetone, absolute ethanol and deionized water for ultrasonic cleaning for 15 minutes each, and dry naturally at room temperature for use;

[0051] Step 2, Preparation of Red Phosphorus Film

[0052] The polished titanium sheet obtained in step 1 is used as a substrate, and a layer of uniform red phosphorus film is plated by chemical vapor deposition (CVD), and the specific steps are:

[0053] 1) Put the red phosphorus powder at 200 °C, hydrothermally treat it for 12 hours, slowly reduce to room temperature, and grind it to a uniform powder below 100 microns after vacuum drying;

[0054] 2) Put the pretreated red phosphorus and titanium sheets in a CVD furnace, first pass argon at a rate of 2 sccm, then heat up at a rate of 10°C / min to 650°C, and keep the tem...

Embodiment 3

[0059] Step 1: Mechanical polishing of titanium sheet

[0060] Polish the titanium sheet with 240 and 800 mesh emery on the polishing machine in turn, until the surface is smooth, then place the polished titanium sheet in acetone, absolute ethanol and deionized water for ultrasonic cleaning for 15 minutes each, and dry naturally at room temperature for use;

[0061] Step 2, Preparation of Red Phosphorus Film

[0062] The polished titanium sheet obtained in step 1 is used as a substrate, and a layer of uniform red phosphorus film is plated by chemical vapor deposition (CVD), and the specific steps are:

[0063] 1) Put the red phosphorus powder at 200 °C, hydrothermally treat it for 12 hours, slowly reduce to room temperature, and grind it to a uniform powder below 100 microns after vacuum drying;

[0064] 2) Put the pretreated red phosphorus and titanium sheets in a CVD furnace, first pass argon at a rate of 2 sccm, then heat up at a rate of 10°C / min to 650°C, and keep the tem...

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Abstract

The invention provides a preparation method of a red phosphorus-zinc oxide heterojunction film for photocatalytic sterilization. The preparation method of the red phosphorus-zinc oxide heterojunctionfilm for photocatalytic sterilization comprises the following steps that first, a titanium sheet is mechanically polished in sequence till the surface of the titanium sheet is smooth, then the titanium sheet is sequentially placed in acetone, absolute ethyl alcohol and deionized water to be separately ultrasonically cleaned for 15 minutes, and then the titanium sheet is naturally dried at the roomtemperature for later use; secondly, a red phosphorus film is prepared, specifically, with the titanium sheet polished in the first step as a substrate, and the uniform red phosphorus is plated on the substrate through chemical vapor deposition; and thirdly, a nano ZnO film is prepared, specifically, the uniform nano ZnO film is plated through atomic layer deposition on the substrate on which thered phosphorus film is deposited. The preparation method has the advantages that the red phosphorus-zinc oxide heterojunction film can skill all bacteria within 20 minutes when irradiated by visiblelight and has a broad-spectrum antibacterial property. In addition, the red phosphorus-zinc oxide heterojunction film has good biocompatibility.

Description

technical field [0001] The invention relates to the technical fields of photocatalysis, semiconductor heterojunction, and biological antibacterial materials, in particular to a preparation method of a red phosphorus-zinc oxide heterojunction thin film for rapid photocatalytic sterilization. Background technique [0002] In response to epidemic diseases caused by pathogenic microorganisms and bacteria such as polluted water sources, medical equipment and food poisoning, there is an increasing demand for new antimicrobial coatings. Among them, drinking water safety is an urgent and important issue worldwide, especially in developing countries where most of the drinking water supply is lacking. In developing countries, 80% of water-borne diseases have been caused by pathogenic microorganisms such as bacteria and fungi in drinking water. For example, in 2012 alone, 1.5 million people died from diarrheal diseases linked to pathogenic microorganisms due to poor drinking water. I...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/455C23C16/40C23C16/28
CPCC23C16/28C23C16/407C23C16/45527
Inventor 吴水林李浚刘想梅
Owner HUBEI UNIV
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