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Photoprotection composition as well as preparation method and application thereof

A composition and photoprotection technology, applied in the directions of drug combination, skin care preparations, pharmaceutical formulations, etc., can solve problems such as weak photoprotection effect and inability to fully protect the skin, and achieve SPF improvement, obvious anti-allergy, and enhanced resistance. effect of action

Active Publication Date: 2018-10-12
GUANGZHOU HUANYA COSMETIC SCI & TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] CN 105796475 A discloses moisturizing and anti-aging cosmetics containing kohlrabi extracts and a preparation method thereof. The cosmetics include the following components: 5-15 parts of kohlrabi extracts, 0.6-3.2 parts of vitamins, and 1-5 parts of antioxidants , 3-12 parts of anti-wrinkle active agent, 1-3 parts of sunscreen agent, 0.5-2 parts of anti-sensitivity agent, 2.5-6 parts of whitening agent, 2-12 parts of moisturizing agent, 0.03-0.2 parts of potassium hydroxide, ingot maple seed 0.5-2 parts of oil, 0.3-1.2 parts of chelating agent, 0.1-0.3 parts of thickener, 1.5-5.8 parts of emulsifier, 0.2-1 part of preservative, 40-80 parts of deionized water, which can improve skin elasticity and delay skin aging. Effects such as aging, but weak photoprotective effect
[0007] Therefore, sunscreen products that only target UVA and UVB can no longer fully protect the skin, and it is necessary to study a full-band photoprotection product to resist the damage of UVA, UVB, HEV and infrared light to the skin

Method used

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  • Photoprotection composition as well as preparation method and application thereof
  • Photoprotection composition as well as preparation method and application thereof
  • Photoprotection composition as well as preparation method and application thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0047] The photoprotective composition comprises the following components by mass percentage: 35.13% of ethylhexyl methoxycinnamate, 11.71% of phenyl benzimidazole sulfonic acid, 22.37% of titanium dioxide, 11.71% of diethylamino hydroxybenzoyl hexyl benzoate %, bis-ethylhexyloxyphenol methoxyphenyl triazine 7.81%, zinc oxide 7.57%; carnosine 0.2%; sunflower flower extract 0.78%; golden chamomile extract 0.78%; tocopheryl acetate 1.94%.

Embodiment 2

[0049] The light protection composition comprises the following components according to mass percentage: 12.50% of titanium dioxide, 79.76% of zinc oxide; 0.60% of carnosine; 2.98% of sunflower flower extract; 2.98% of golden chamomile extract;

Embodiment 3

[0051] The photoprotective composition comprises the following components by mass percentage: 45.38% of ethylhexyl methoxycinnamate, 12.97% of phenyl benzimidazole sulfonic acid, 19.45% of diethylamino hydroxybenzoyl hexyl benzoate, bis- Ethylhexyloxyphenol Methoxyphenyl Triazine 9.72%, Methylenebis-Benzotriazolyl Tetramethylbutylphenol 6.48%; Carnosine 0.16%; Sunflower Flower Extract 3.24%; Golden Chamomile Extract 1.30% ; Tocopheryl Acetate 1.30%.

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Abstract

The invention provides a photoprotection composition as well as a preparation method and application thereof. The composition is prepared from an ultraviolet absorbent, carnosine, sunflower extract, chrysanthellum indicum extract and tocopheryl acetate. According to the photoprotection composition provided by the invention, the carnosine, the sunflower extract, the chrysanthellum indicum extract and the tocopheryl acetate have a synergetic effect and are matched with the ultraviolet absorbent so that the effect of resisting full-wave band optical radiation is realized; the resistance effects on UVA (Ultraviolet A) and UVB (Ultraviolet B) are enhanced and the photoprotection composition has a resisting capability on blue light and infrared light.

Description

technical field [0001] The invention belongs to the technical field of cosmetics, and relates to a photoprotective composition and a preparation method and application thereof. Background technique [0002] In recent years, the destruction of the ozone layer has led to excessive sunlight exposure worldwide and a significant increase in skin diseases. Skin sun protection has attracted widespread attention. The wavelength range of the ultraviolet spectrum in sunlight is 200-400nm, which can be divided into 3 bands, namely short-wave ultraviolet (UVC) with a wavelength of 200-290nm, medium-wave ultraviolet (UVB) with a wavelength of 290-320nm and 320-400nm long-wave ultraviolet (UVA). Among them, UVA has a strong penetrating power, can directly reach the dermis of the skin, destroy elastic fibers and collagen fibers, tan the skin and produce wrinkles; UVB has an erythema effect on the human body, and long-term or excessive exposure will cause the skin to tan , and cause redne...

Claims

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Application Information

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IPC IPC(8): A61K8/9789A61K8/67A61K8/64A61P37/08A61Q17/04A61Q19/08
CPCA61K8/64A61K8/678A61Q17/04A61Q19/08A61K8/9789A61P37/08
Inventor 吴知情陈佳龄孟潇龚盛昭陈庆生许锐林胡兴国
Owner GUANGZHOU HUANYA COSMETIC SCI & TECH CO LTD
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