A scr device for input output port and power supply clamp
A technology of input and output ports and devices, which is applied in the field of ESD protection SCR device structure, can solve the problems of affecting the normal operation of devices, false triggering of SCR devices, and inability to use circuit input and output ports, etc.
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Embodiment 1
[0031] This embodiment provides an ESD protection SCR device used for input and output ports and power supply clamping. The structure and equivalent circuit of the SCR device are as follows: figure 2 As shown, its structure includes:
[0032] p-type silicon substrate 110;
[0033] A well region is formed on the p-type silicon substrate 110, the well region includes an n-type well region 120 and a p-type well region 130, and the well region 120 is adjacent to the well region 130;
[0034] The n-type well region 120 is provided with an n-type heavily doped region 121 and a p-type heavily doped region 122, and the n-type heavily doped region 121 and the p-type heavily doped region 122 are connected to the anode of the SCR device ;
[0035] The p-type well region 130 is provided with an n-type heavily doped region 131 and a p-type heavily doped region 132, and the n-type heavily doped region 131 and the p-type heavily doped region 132 are connected to the cathode of the SCR dev...
Embodiment 2
[0043] This embodiment provides an ESD protection SCR device used for input and output ports and power supply clamping. The structure and equivalent circuit of the SCR device are as follows: image 3 As shown, its structure is different from the structure in Embodiment 1 only in that the gate oxide layer region 150 on the silicon surface of the n-type well region 120 without the device structure region is arranged on the p-type heavily doped region 122 and the n-type heavily doped region on the silicon surface between the doped regions 123 . Thus, under the same ESD robustness, the structure shown in embodiment 2 has a smaller area than the structure in embodiment 1.
[0044] The SCR device consists of a main bleeder device and an auxiliary control device; the main bleeder device is composed of a parasitic PNP transistor, a parasitic NPN transistor, an external P-channel MOSFET device and a parasitic N-channel MOSFET device constitute. Among them, p-type heavily doped region...
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Abstract
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