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Vinyl sulfone-based silicon nano material surface functionalization method

A technology of surface functionalization and nanomaterials, which is applied in the field of inorganic-organic composite preparation, can solve the problem of the oxide layer hindering the reaction, and achieve the effect of wide applicability, high stability and simple operation of the substrate

Active Publication Date: 2018-08-21
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, silicon-based materials require special pretreatment (low-pressure hydrogen or fluorine reagents) to generate Si-H bonds, and the generated Si-H bonds are very sensitive to water and oxygen, and are easily oxidized to form an oxide layer under humid or aerobic conditions. Hinder the reaction, therefore, the reaction needs to be carried out under anhydrous and oxygen-free conditions

Method used

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  • Vinyl sulfone-based silicon nano material surface functionalization method
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  • Vinyl sulfone-based silicon nano material surface functionalization method

Examples

Experimental program
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Effect test

Embodiment 1

[0036] Example 1: Functionalization of colloidal silicon nanomaterials with polyethylene glycol 2000-vinyl sulfone (PEG 2000-VS) and its anti-protein adsorption function test

[0037] The colloidal silica nanomaterials (Colloidal silica, AS 40 TM , Sigma) dispersed in ethanol, acid treatment to increase the density of silanol on the surface of the material. The treated colloidal silica nanomaterials were centrifuged and washed three times with acetonitrile and stored for future use. Take 400 mg of the treated colloidal silicon nanomaterials and disperse them in 20 mL of acetonitrile. Add 500 mg of PEG 2000-VS into the colloidal silicon nanomaterial solution and fully dissolve it, add 65 mg of triphenylphosphine as a catalyst, and react under reflux for 12 hours. The PEG 2000-VS functionalized colloidal silica nanomaterials were obtained after centrifugation and washed three times with acetonitrile. Colloidal silica nanomaterials before and after functionalization were chara...

Embodiment 2

[0039] Example 2: Functionalization of Fumed Silica Material with Polyethylene Glycol 2000-Vinyl Sulfone (PEG 2000-VS)

[0040] 100 mg of fumed silica material (Sigma) was ultrasonically dispersed in 20 mL of acetonitrile. Add 1.0 g of PEG 2000-VS to the fumed silica material solution and fully dissolve it, add 262 mg of triphenylphosphine as a catalyst, and react under reflux for 12 hours. The PEG 2000-VS functionalized fumed silica material was obtained after centrifugation and three washes with acetonitrile. The dynamic light scattering method (DLS) was used to characterize the hydraulic diameter of the gas-phase silica material before and after functionalization, as shown in the attached Image 6 shown. The particle size of the fumed silica material functionalized with PEG2000-VS was about 50nm larger than that of the unfunctionalized fumed silica material, indicating that the functionalization of PEG2000-VS was successful. The fumed silica material before and after fun...

Embodiment 3

[0041] Example 3: Functionalization of mesoporous silicon materials with polyethylene glycol 2000-vinylsulfone (PEG 2000-VS)

[0042] 50 mg of mesoporous silica material (MCM 41, Sigma) was ultrasonically dispersed in 10 mL of acetonitrile. Add 100 mg of PEG 2000-VS into the MCM 41 solution and fully dissolve it, add 37 mg of triphenylphosphine as a catalyst, and react under reflux for 12 hours. PEG 2000-VS functionalized MCM 41 was obtained after centrifugation and three washes with acetonitrile. MCM41 before and after functionalization was characterized using thermogravimetric analysis, as shown in the attached Figure 8 shown. The mass loss of PEG 2000-VS functionalized MCM 41 at 100 °C was due to the evaporation of solvent water adsorbed by nanomaterials; the mass loss at 350 °C was due to the formation of Si-O-C bond breakage, several Layer exfoliation, this phenomenon indicates that PEG 2000-VS functionalization was successful. Through thermogravimetric analysis, the...

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Abstract

The invention discloses a vinyl sulfone-based silicon nano material surface functionalization method which comprises the step: enabling a vinyl sulfone derivative to directly react with silicon hydroxyl on the surface of a material under a catalysis condition, thereby achieving covalent functionalization of a silicon-based material. By adopting the method, functionalization of multiple silicon nano materials can be achieved, and the method is wide in substrate application range; the material does not need to be pretreated, and the method is high in operability and high in reproducibility; themethod is gentle in reaction condition, simple to operate and good in environment protection; a single-layer function surface can be generated, and high reaction controllability can be achieved; and the method is a broad spectrum silicon nano material surface functionalization method with great potential.

Description

technical field [0001] The invention belongs to the field of preparation of inorganic-organic composites, and specifically relates to a new method for surface functionalization of silicon nanomaterials, in particular to a surface functionalization method based on the Michael addition reaction of silicon hydroxyl groups and vinyl sulfone groups. technical background [0002] As a material with low price, many types, wide application, high stability and strong machinability, silicon-based materials can be seen everywhere in daily life and scientific research, such as single crystal silicon, glass, optical fiber, etc., and are widely used in aviation Aerospace, electrical and electronic, construction, transportation, energy, chemical, textile, food, light industry, medical, agricultural and other industries. Among them, silicon nanomaterials have been widely used in biomedical fields such as cell culture, drug delivery, and antibacterial coatings due to their large specific sur...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G83/00
CPCC08G83/001
Inventor 程昉王汉奇何炜孙冰冰曲景平
Owner DALIAN UNIV OF TECH
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