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Photosensitive resin composition and water washing resin plate

A resin composition and photosensitive resin technology, applied in the field of photosensitive resin composition and water-washed resin plate, can solve the problems of increasing process complexity, tacky surface, large volume shrinkage rate, etc., and achieve imaging sharpness and graphic definition Improve, high hardness and wear resistance, overcome the effect of oxygen inhibition

Active Publication Date: 2018-06-01
CHINA LUCKY FILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, due to the free radical photopolymerization of carbon-carbon double bonds is susceptible to the influence of oxygen inhibition, insufficient polymerization leads to sticky surface and large volume shrinkage, which affects the quality of printing plates
In order to overcome this shortcoming, vacuum curing, post-exposure and heating baking are usually used to debond, but the effect is limited and the complexity of the process is increased.

Method used

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  • Photosensitive resin composition and water washing resin plate
  • Photosensitive resin composition and water washing resin plate
  • Photosensitive resin composition and water washing resin plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0049] The present invention will be described in detail below through examples. Unless otherwise specified, the parts described in the examples refer to parts by weight.

Synthetic example 1

[0051] P1 (3-mercaptopropionic acid modified polyvinyl acetate resin)

[0052] In a 250ml four-necked bottle equipped with a stirrer, condenser, constant pressure titration funnel, and thermometer, add 20 parts of PVA resin NK-05 (Nippon Synthetic Chemical Industry Co., Ltd., polymerization degree 500, saponification degree 71~75mol%), 100 parts of N,N-dimethylformamide (DMF), heated to 100°C, 3 parts of 3-mercaptopropionic acid, 0.1 part of p-toluenesulfonic acid, 5 parts of DMF were added dropwise, reacted for 2 hours, and then carried out with 300 parts of acetone Precipitate to obtain mercapto-modified PVA resin. The polymer is soluble in water at 25°C.

[0053] P2 (3-mercaptoisobutyric acid modified polyvinyl acetate resin)

[0054] Except that the thiol compound was replaced with 3-mercaptoisobutyric acid, the procedure was carried out exactly the same as in P1. The polymer is soluble in water at 25°C.

[0055] P3 (KH580 modified polyvinyl acetate resin)

[0056] In...

Embodiment 1

[0060] The above-mentioned synthetic mercapto-modified polyvinyl acetate resin is added to the formula of the photosensitive resin layer, as shown in the following table:

[0061]

[0062]

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Abstract

The invention discloses a photosensitive resin composition and a water washing resin plate. The photosensitive resin composition comprises the following ingredients in parts by mass: 55-75 parts of sulfydryl modified PVA (polyvinyl alcohol) resin, 60-80 parts of solvent, 22-45 parts of active monomer, 2-10 parts of plasticizer, 1-3 parts of photoinitiator, 0.01-0.05 parts of polymerization inhibitor and 0-0.1 parts of other assistant, wherein sulfydryl accounts for 0.5-10wt% of the sulfydryl modified PVA resin; and a degree of saponification of the PVA resin is 60-95mol%. Sulfydryl modified PVA is used as matrix resin in the photosensitive resin composition; sulfydryl and a carbon-carbon double bond of the active monomer are subjected to 'sulfydryl-ethylene' photocuring; oxygen inhibitioncan be effectively overcome; and steps of 'viscosity removal' and 'post exposure' in a platemaking process are simplified.

Description

technical field [0001] The invention relates to the field of flexographic printing, in particular to a photosensitive resin composition and a water-washable resin plate. Background technique [0002] In the early 1980s, water-washable photosensitive resin plates suitable for letterpress printing were successfully developed, which can produce high-quality printing results. The biggest advantage of water-washed plate is that it can be washed with water, and the plate-making process is more environmentally friendly, which has attracted more and more attention. [0003] Photosensitive resin is one of the most important components in water-washed plates, and its performance determines the performance of water-washed plates. The performance requirements of the photosensitive resin are mainly: it can be washed off with water when it is not exposed, it can be cross-linked and solidified after exposure, and it cannot be washed off with water. [0004] As one of the most important c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/027G03F7/09
CPCG03F7/004G03F7/027G03F7/09
Inventor 周健刘孟姜伟解雅玲李娜赵伟建
Owner CHINA LUCKY FILM CORP
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