A kind of preparation method of hydrotalcite-based magneto-optic film material
A thin film material, hydrotalcite-based technology, applied in metal material coating process, coating, liquid chemical plating, etc., can solve the problem of hindering the development of LDHs-based composite functional thin film materials, limiting the selection of assembly elements, and the driving force of film formation Single and other problems, to achieve the effect suitable for large-scale industrial application, strong practicability, uniform and dense texture
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0019] (1) Put the polytetrafluoroethylene substrate into the groove of the cathode plate, add metal ion solution and urea solution with a volume ratio of 1:1, where the metal ion is Mg 2+ 、Co 2+ 、Ni 2+ , Ca 2+ , Ga 3+ 、In 3+ 、Co 3+ , Fe 3+ , V 3+ , the concentration of urea solution is 2.5mole / L;
[0020] (2) Place the reaction treatment device in step (1) in the vacuum chamber, close the vacuum chamber to evacuate, when the vacuum degree of the vacuum chamber is 10 -3 At Pa, turn on the power to heat the cathode plate and the anode plate, the temperature of the cathode plate is controlled to 550°C, and the temperature of the anode plate is 260°C, start the power supply of the plasma generator outside the vacuum chamber, and feed sulfur, hydrogen, argon 1:2 : 1 mixed gas, continue to react for 12h, obtain the precursor of hydrotalcite-based magneto-optical thin film material;
[0021] (3) The film precursor of the above step (2) is placed in a carbon dioxide atmosphe...
Embodiment 2
[0025] (1) Put the polytetrafluoroethylene substrate into the groove of the cathode plate, add metal ion solution and urea solution with a volume ratio of 1:1, in which the metal ion is Ni 2+ , Ca 2+ 、Cu 2+ , Fe 2+ 、 Al 3+ 、 Cr 3+ , Ga 3+ , the concentration of urea solution is 2.5mole / L;
[0026] (2) Place the reaction treatment device in step (1) in the vacuum chamber, close the vacuum chamber to evacuate, when the vacuum degree of the vacuum chamber is 10 -4 At Pa, turn on the power to heat the cathode plate and the anode plate. The temperature of the cathode plate is controlled at 650°C, and the temperature of the anode plate is 350°C. Start the power supply of the plasma generator outside the vacuum chamber, and feed sulfur, hydrogen, and argon at a ratio of 1:2. : 1 mixed gas, continue to react for 24h, obtain the precursor of hydrotalcite-based magneto-optical film material;
[0027] (3) The film precursor of the above step (2) is placed in a carbon dioxide atmos...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com