Modification Method of Single Hydroxyl Functionalization of Fluorine Resin

A fluorine-containing resin and hydroxyl functional technology, which is applied in the field of modification of single hydroxyl functional group, and can solve problems such as poor selectivity

Active Publication Date: 2020-07-07
INST OF CHEM MATERIAL CHINA ACADEMY OF ENG PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since low-temperature plasma energies are typically about an order of magnitude higher than conventional covalent bond energies, this method is hardly chemoselective for chemical grafting of membrane materials.
At the same time, low-temperature plasma activation only occurs on the surface of the material, so the modification of the material body has certain limitations.
[0005] Plasma treatment combined with appropriate chemical post-treatment can better overcome the problem of poor selectivity caused by the above-mentioned low-temperature plasma treatment itself

Method used

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  • Modification Method of Single Hydroxyl Functionalization of Fluorine Resin
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  • Modification Method of Single Hydroxyl Functionalization of Fluorine Resin

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Effect test

Embodiment 1

[0027] Modification methods for single hydroxyl functionalization of fluorine-containing resins, including:

[0028] (1) Process the fluororesin F2314 into a thin film with a thickness of 1 μm, put it into the substrate stage of the vacuum chamber of the plasma reactor, evacuate to 1Pa, then pass oxygen until the pressure of the vacuum chamber reaches 10Pa, the irradiation time (etching time) ) is 200s, and the irradiation power is 150W. Stop the discharge, and take out the film after venting with oxygen.

[0029] (2) Dissolve the treated film in anhydrous tetrahydrofuran, add the same mass of sodium borohydride and react at 15° C. for 0.5 hour. After the reaction, the solution was added dropwise to a large amount of distilled water. After the precipitation was complete, the precipitate was washed repeatedly and dried for later use.

Embodiment 2

[0031] Modification methods for single hydroxyl functionalization of fluorine-containing resins, including:

[0032] (1) Process the fluororesin F2314 into a thin film with a thickness of 5 μm, put it into the substrate stage of the vacuum chamber of the plasma reactor, evacuate to 1Pa, then pass oxygen until the pressure of the vacuum chamber reaches 10Pa, the irradiation time (etching time) ) is 200s, and the irradiation power is 150W. Stop the discharge, and take out the film after venting with oxygen.

[0033] (2) Dissolving the treated film in anhydrous tetrahydrofuran, adding the same mass of lithium aluminum hydride and reacting at 15° C. for 3 hours. After the reaction, the solution was added dropwise into a large amount of ethanol, and the precipitate was washed repeatedly after the precipitation was complete, and dried for later use.

Embodiment 3

[0035] Modification methods for single hydroxyl functionalization of fluorine-containing resins, including:

[0036] (1) Process the fluororesin F2314 into a thin film with a thickness of 10 μm, put it into the substrate stage of the vacuum chamber of the plasma reactor, evacuate to 1Pa, then pass oxygen until the pressure of the vacuum chamber reaches 10Pa, the irradiation time (etching time) ) is 600s, and the irradiation power is 250W. Stop the discharge, and take out the film after venting with oxygen.

[0037] (2) Dissolving the treated film in anhydrous tetrahydrofuran, adding the same mass of lithium aluminum hydride and reacting at 15° C. for 1.5 hours. After the reaction, the solution was added dropwise to a large amount of distilled water. After the precipitation was complete, the precipitate was washed repeatedly and dried for later use.

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Abstract

The invention discloses a modification method for single hydroxyl functionalization of fluorine-containing resin. The modification method comprises the following steps: Step 1: processing the fluorine-containing resin into a film with a certain thickness; Step 2: plasma-activating a surface of the fluorine-containing resin film; Step 3: using a reducing agent to reduce a complex oxygen-containingfunctional group on the surface of the fluorine-containing resin into a single hydroxyl. The fluorine-containing resin obtained by the method used in the invention has an excellent adhesive property;compared with a traditional way of activating the fluorine-containing resin with high-activity metal, the method has an advantage of simple and safe operation; the obtained hydroxyl-containing fluorine-containing resin can utilize the hydroxyl for further molecular designing to broaden an application field of materials.

Description

technical field [0001] The invention relates to a material modification method, in particular to a modification method for performing single hydroxyl functionalization on fluorine-containing resins by using low-temperature plasma. Background technique [0002] In the field of energetic material processing, fluorine-containing resin is often used for bonding energetic material particles, and is an important part of the bonding system. Only under its action, energetic material particles can maintain a certain geometric shape and a good shape. mechanical properties. The advantage of fluororesin lies in its relatively high density, excellent low temperature performance and physical and chemical stability. The commonly used fluororesin is F2314 (1:4 copolymer of vinylidene fluoride and chlorotrifluoroethylene). [0003] Although fluorine-containing resins have many advantages, their disadvantages are also obvious. The most important point is that due to the high fluorine conten...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08J7/12C08L27/12
Inventor 黄鑫黄忠孙银双
Owner INST OF CHEM MATERIAL CHINA ACADEMY OF ENG PHYSICS
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