Positive type photosensitive resin composition for display device and display device comprising same
A technology of photosensitive resin and display device, which is applied in the direction of photosensitive materials used in optomechanical equipment, optics, optomechanical equipment, etc., and can solve problems such as difficult to achieve high resolution
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Embodiment 1
[0138] Embodiment 1 (production of photosensitive resin composition)
[0139] With respect to 100 parts by weight of the copolymer whose solubility is increased by the photoacid generator of the following chemical formula 1-A, dissolve (Z)-4-methoxy-N-(toluenesulfonyloxy) as an oxime photoacid generator Base) 10 parts by weight of benzyl iminocyanamide, 2-[2-(furan-2-yl) vinyl]-4,6-bis(trichloromethyl)-same triazine-based photoacid generator 1 part by weight of oxazine, 0.5 part by weight of triethylamine as an organic base, and dissolved in propylene glycol monomethyl ether acetate so that the solid content of the above mixture is 20% by weight, and then utilize a 0.1 μm microporous filter Filtration to produce a photosensitive resin composition.
[0140]
Embodiment 2
[0142] When producing the photosensitive resin composition in the above-mentioned embodiment 1, use 2-[2-(furan-2-yl)vinyl]-4,6-bis(trichloromethyl)-s-triazine 3 parts by weight as triazine Except for the oxazine photoacid generator, the method similar to the said Example 1 was implemented and the photosensitive resin composition was manufactured.
Embodiment 3
[0144] When producing the photosensitive resin composition in the above-mentioned embodiment 1, use 2-[2-(3,4-dimethoxyphenyl)vinyl]-4,6-bis(trichloromethyl)-s-triazine Except having used 3 weight part as a triazine type photoacid generator, the method similar to said Example 1 was implemented, and the photosensitive resin composition was manufactured.
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