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fbar micro pressure sensor based on shear wave mode excited in thickness direction

A technology of micro pressure sensor and thickness direction, which is applied in the measurement of the frequency change force of the stressed vibrating element, etc., which can solve the problems of large longitudinal wave attenuation, affecting the mechanical firmness of the device, and reducing the yield, so as to achieve mechanical firmness High density, low power consumption, and miniaturization

Inactive Publication Date: 2020-02-07
ZHONGBEI UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The disadvantages of this solution are: 1. The micro pressure sensor adopts a back-etched structure, which will inevitably affect the mechanical firmness of the device due to the use of MEMS bulk silicon technology to etch and remove most of the silicon material from the back of the silicon wafer. , although a low-stress support layer is set, the yield rate is greatly reduced; Second, the micro pressure sensor adopts the longitudinal wave mode, and the longitudinal wave attenuates greatly in the liquid phase environment or viscous medium. The use of the longitudinal wave mode limits the FBAR micro Application fields and occasions of pressure sensors

Method used

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  • fbar micro pressure sensor based on shear wave mode excited in thickness direction
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  • fbar micro pressure sensor based on shear wave mode excited in thickness direction

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Embodiment Construction

[0030] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the present invention, rather than All the embodiments; based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative work all belong to the protection scope of the present invention.

[0031] Such as figure 1 and figure 2 Shown is a FBAR micro-pressure sensor based on the excitation of shear wave mode in the thickness direction proposed by the present invention, which includes a silicon substrate 1, an insulating layer 2, a Bragg reflective layer 3, a bottom electrode 4, and an AlN pressure sensor arranged in sequence from bottom to top. Electric thin film 5, top electrode 6, micro pressure sens...

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Abstract

The invention belongs to the field of microelectronic devices and provides a FBAR micro-pressure sensor based on a thickness-excited shear mode. The FBAR micro-pressure sensor comprises a silicon substrate, an insulating layer deposited on the upper surface of the silicon substrate, a Bragg reflective layer deposited on the upper surface of the insulating layer, a bottom electrode deposited on the upper surface of the Bragg reflective layer, an AlN piezoelectric film disposed above the bottom electrode and the Bragg reflective layer, a top electrode disposed on the upper surface of the AlN piezoelectric film and with a shape the same as that of the bottom electrode and a position corresponding to that of the bottom electrode, four micro-pressure sensitive layers deposited on the upper surface of the piezoelectric film, symmetrically arranged at the edge of the piezoelectric film and staggered with the top electrode, and a micro-pressure applying layer bonded to the micro-pressure sensitive layer. The FBAR micro-pressure sensor has a high Q value, high operating frequency, high resolution, high sensitivity, low energy consumption, good firmness and low cost, and can be widely applied to the field of the micro-pressure sensors.

Description

technical field [0001] The invention relates to an FBAR micro pressure sensor, in particular to an FBAR micro pressure sensor based on a thickness direction excitation shear wave mode, and belongs to the field of microelectronic devices. Background technique [0002] With the development of integrated circuit manufacturing technology, film bulk acoustic resonator (FBAR) develops rapidly. Because of its high quality factor, high resonance frequency, low insertion loss, high detection accuracy, compatibility with CMOS technology, and relatively small size. It satisfies the needs of handheld mobile and wearable devices very well, so it has obtained a wide range of commercial applications in the field of mobile communications. On this basis, its superiority in the field of sensors is arousing widespread research interest. [0003] Pressure is one of the most basic physical quantities, whether in daily life or in the industrial field, micro pressure sensors are widely used. Th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01L1/10
CPCG01L1/10
Inventor 马晓鑫苏淑靖耿子惠熊继军谭秋林
Owner ZHONGBEI UNIV
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