Manufacturing method of half-cell piece
A manufacturing method, a half-cell technology, applied in the direction of manufacturing tools, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of uneven section of the grid wire, increased power loss, increased fragmentation rate, etc., to achieve capital investment The effect of less, package power loss reduction, and defect reduction
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[0056] The first step is to select a complete 156mm*156mm P-type polysilicon wafer, and go through wet texturing-phosphorus diffusion-wet etching-removal of PSG-PECVD coating.
[0057]The second step is to use the half-cell battery pattern for screen printing, print the back electrode, dry at 280°C for 5s, print the back electric field, dry at 280°C for 5s, print the positive electrode, the half-cell size is 156mm*78mm, and 4 main grids Lines, the distance between the main grid lines is 39mm, the width of the main grid lines is 1.1mm, eight sections, the total length is 155mm, the width of the auxiliary grid lines is 35μm, 100 lines, the distance between two adjacent thin grid lines is 1.54mm, and sintered at 790°C for 2s.
[0058] The third step is to laser cut the battery sheet along the center line, adjust the laser power to make the cutting thickness reach 2 / 3 of the battery thickness, and then use the laser to cut off the cut right angle, the length of the right angle side...
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