Vacuum ultraviolet light source device through coaxial gas discharge
A technology of vacuum ultraviolet light source and gas discharge, applied in gas plasma lamps, lamp parts and other directions, can solve the problems of low output optical power and low photon utilization rate, achieve high effective vacuum ultraviolet light power, increase effective area, The effect of improving the utilization rate of the light source
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specific Embodiment approach 1
[0017] Specific implementation mode one: combine figure 1 To illustrate this embodiment, the overall structure of the coaxial gas discharge vacuum ultraviolet light source device described in this embodiment includes a central cylindrical interaction cavity, a coaxial annular discharge light source cavity, a radio frequency spiral resonance excitation cavity and an ultra-high vacuum flange connector. part. The specific implementation steps are as follows: first, the solenoid coil 3 is sleeved on the outside of the quartz glass tube 2, and bonded in the installation groove of the flange connector 5 with an adhesive that can be used in an ultra-high vacuum environment, so as to realize the connection between the outer wall of the discharge light source cavity and Atmospheric vacuum sealing, the length of the quartz glass tube determines the overall length reference of the entire device; secondly, the copper shielding layer 4 is installed on the outside of the solenoid coil 3 in ...
specific Embodiment approach 2
[0018] Specific embodiment two: this embodiment is a further limitation of the coaxial gas discharge vacuum ultraviolet light source device described in embodiment one, combined with figure 1 This embodiment will be described. In this embodiment, the gas conduit 6 on the flange connector 5 can be increased or decreased as required. By adjusting the switch mode of the gas conduit 6, switching between different working states of flowing gas and non-flowing gas can be realized: the working gas in the flowing gas state has There are also inlets and outlets. When the vacuum ultraviolet lamp is working, the gas is in a dynamic balance in the discharge light source cavity; according to the way of inlet and outlet, it can also be divided into forward flow (6-1 is the inlet, 6-3 is the outlet) and countercurrent (6-1 for import, 6-2 for export). When working in a non-flowing state, the gas is sealed inside the cavity of the discharge light source and is in a static state.
specific Embodiment approach 3
[0019] Embodiment 3: This embodiment is a further limitation of the coaxial gas discharge vacuum ultraviolet light source device described in Embodiment 1. In this embodiment, according to the needs of practical applications, the discharge light source chamber can be filled with Helium, neon, argon, krypton, xenon and other different working gases or mixed gases are used to generate vacuum ultraviolet light with different wavelengths; by adjusting the gas pressure in the discharge light source cavity and the frequency and power of the RF signal in the spiral resonant cavity, etc., The output power of the vacuum ultraviolet light can be adjusted to meet the needs of different applications for the light source.
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