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High-purity quartz production device

A production device, quartz technology, applied in glass forming, dispersed particle filtration, gas treatment, etc., can solve problems such as dust easily falling into, product scrapping, and product quality degradation

Active Publication Date: 2017-06-09
杭州永通智造科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The existing CVD production of high-purity quartz reaction furnaces all adopt a single-layer structure, and the heat-insulating bricks are directly exposed outside, which is easy to accumulate dust and is not easy to clean
Therefore, dust is easy to fall into the products in the furnace during production. Operators need to carry out frequent inspections to pick out the dust impurities in the products in time. The particles that cannot be picked out will directly lead to the scrapping of the products. At the same time, the insulation brick materials are directly exposed to the The interior is not clean and beautiful
The high-temperature heat in the furnace directly dissipates heat through the gap of the blowtorch into the workshop environment, which will cause the indoor temperature to be too high and increase the cost of cooling
It adopts a single-layer structure, and at the same time, in order to maintain the high temperature in the furnace, the exhaust air volume in the furnace is required to be kept very small, so that the hydrogen chloride waste gas and silica dust produced in the reaction furnace can easily overflow into the workshop, which is harmful to personal safety and safety. The company's property is in great danger
[0005] The tower body equipment produced by the CVD process is all open, without forming a sealed cabin and gas flow field. The environment of the tower body and other devices is harsh, high temperature and corrosive gases exist, and the equipment is prone to abnormalities. There is a lot of dust, etc., which affects product quality
At present, the traditional CVD process tower equipment mainly has the following defects: (1) The tower body is affected by the furnace temperature radiation, the temperature is relatively high, the life of each device and accessories is short, prone to abnormalities, and the operation is unstable at the same time, affecting product quality; (2) ) The tower body is affected by the hydrogen chloride tail gas overflowing from the furnace, and the devices and accessories are prone to corrosion, short life, prone to abnormalities, and unstable operation at the same time, which affects product quality; (3) is an open environment, and dust and other particles in the environment are easy to enter In the tower body, and then enter the furnace chamber where the product reacts, reducing the product quality

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Embodiment Construction

[0026] Attached below Figure 1-7 To further describe the invention:

[0027] Such as figure 1 As shown, the high-purity quartz production device of the present invention includes a reaction furnace 1 and a tower body 2, wherein the structure of the reaction furnace is as follows figure 2Shown: reaction furnace 1 is cylindrical, is made up of the furnace cover that furnace hearth 101, heat insulation layer 102, insulation layer 103 and metal material are made from inside to outside, and furnace cover comprises the furnace that is attached to the outer peripheral surface of insulation layer 103 The furnace cover 105 and the furnace roof 106 on the upper surface of the seat 104, the insulation layer 103, the furnace roof 106 is arranged on the top of the reaction furnace 1, and a furnace roof cavity 107 is formed between the furnace cover 105; the furnace 101 is provided with at least one furnace row Gas port 108, furnace exhaust port 108 passes through heat insulation layer ...

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Abstract

The invention provides a high-purity quartz production device. The high-purity quartz production device comprises a reacting furnace and a tower body, wherein the reacting furnace comprises a hearth, a heat insulation layer, a heat preserving layer and a metallic furnace cover which are arranged from inside to outside; the hearth is provided with at least one hearth air outlet which passes through the heat insulation layer, the heat preserving layer and a furnace seat; furnace top air inlets and furnace top air outlets are formed in the furnace top; the furnace top air outlets are not lower than the furnace top air inlets and are positioned on two sides of the furnace top; the hearth air outlet and the furnace top air outlet are correspondingly connected to a waste gas treating device; the tower body is arranged at the bottom part of the hearth and comprises a tower body bracket which is vertically arranged on the ground, a guide rail which is arranged on one side of the tower body bracket, and a base which is arranged on the guide rail; the base can be driven by a motor to move up and down along the guide rail; a product holder is arranged on the base and can move and rotate on the base through the motor. With the adoption of the production device, the external pollution and the safety treatment of waste gas in the production can be effectively avoided and achieved.

Description

technical field [0001] The invention relates to a production device of high-purity quartz, in particular to a device for producing high-purity quartz by CVD. Background technique [0002] The industrial production technology of quartz glass mainly includes electric melting process, gas refining process, synthetic quartz glass manufacturing process, and high-frequency plasma flame melting process. Among them, synthetic quartz glass technology includes chemical vapor deposition (CVD) process, vapor phase axial deposition (VAD) process, plasma chemical vapor deposition (PCVD) and so on. The CVD process has great advantages over other methods in the production of large-scale and high-purity quartz glass. At present, large-scale and high-purity quartz glass is generally produced by CVD process. [0003] The equipment for producing large-scale and high-purity quartz glass by CVD process is mainly composed of two parts, one part is the reaction furnace that provides a high-tempera...

Claims

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Application Information

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IPC IPC(8): C03B20/00C03B19/14B01D46/00B01D53/00
CPCB01D46/00B01D53/00C03B19/1423C03B19/1446B01D2257/2045C03B19/1407
Inventor 单兰英
Owner 杭州永通智造科技有限公司
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