Thin film transistor and manufacturing method thereof
A technology of thin film transistors and manufacturing methods, applied in the direction of transistors, semiconductor/solid-state device manufacturing, electric solid-state devices, etc., can solve the problems of complex film structure and large off-state current of thin-film transistors, simplify the process, ensure electrical performance, The effect of reducing the off-state current
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[0031] The manufacturing method of the thin film transistor provided by the embodiment of the present invention and the specific implementation manner of the thin film transistor will be described in detail below with reference to the accompanying drawings.
[0032] An embodiment of the present invention provides a method for manufacturing a thin film transistor, such as figure 2 As shown, can include:
[0033] S101, sequentially forming patterns of a buffer layer, a gate, and a gate insulating layer on the base substrate;
[0034] S102, forming an amorphous silicon layer on the base substrate with a pattern of a gate insulating layer;
[0035] S103, forming a metal induction layer on the base substrate formed with the amorphous silicon layer;
[0036] S104, performing annealing treatment on the base substrate formed with the metal induction layer;
[0037] S105. Perform a patterning process on the annealed substrate to form a first doped region corresponding to the active...
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