Developer alkali liquor concentration measuring method and adjusting method

Abstract

The invention discloses a developer alkali liquor concentration measuring method and adjusting method; the measuring method comprises: collecting data, to be specific, collecting an online alkali liquor concentration value and actual alkali liquor concentration value of a developer sample when different numbers of substrates are under developing; establishing a model, to be specific, establishing a correction function model for alkali liquor error and substrate sample number according to an alkali liquor error acquired by subtracting the measured online alkali liquor concentration value by the actual alkali liquor concentration value; importing in the model, to be specific, importing the correction function model into an online measuring system to obtain an actual alkali liquor concentrating value. By establishing the correction function model for alkali liquor concentration in a developer and developing sheet number and using a function relational model to correct an existing online conductivity meter measuring system, the disturbance of development products increased in a developing system with the increased number of developing sheets is maximally reduced, accurate and quick online measurement and monitoring are provided for the alkali liquor concentration in the developer, high-precision management is provided for the composition and concentration of the developer, and the formation of precise developed graphs is technically guaranteed.

Description

technical field [0001] The invention relates to the technical field of manufacturing liquid crystal display panels, in particular to a method for measuring and adjusting the concentration of a developing solution alkali solution. Background technique [0002] The production of TFT-LCD (thin film transistor-liquid crystal display, thin film transistor liquid crystal display) is roughly divided into three major processes: array, box forming, and module, and the array process is roughly divided into film formation, photolithography and Etching three major processes. Exposure and development are the two most critical steps in the photolithography process. Exposure is a photochemical reaction that precisely transfers the pattern on the mask plate to the photoresist. The colloid is removed, leaving the cavity film of the unphotosensitive or photosensitive part, so as to display the required graphics; the development process is to put the exposed glass substrate into the developin...

AI Technical Summary

Problems solved by technology

At the same time, the lye continuously absorbs CO2 in the air, causing the concentration of carbonate and bicarbonate in the system to increase continuously. The increased conductive ions above will interfere with the decreasing lye ions, making the concentration of lye measured by the conductivity meter Greater than the actual theoretical value, the measurement result is inaccurate

And the more the number of developing films, the greater the deviation will be, seriously affecting the quality of developing products

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