Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for producing micro-needle array templates based on laser etching technology as well as products and application thereof

A microneedle array and laser etching technology, which is applied in laser welding equipment, surgery, manufacturing tools, etc., can solve the difficulties in mass production and application of microneedle array templates, complicated preparation process of microneedle array templates, poor structural design, etc. problem, to improve the effect of transdermal treatment, improve skin permeability, and easy to cure and form.

Inactive Publication Date: 2017-03-22
HUAZHONG UNIV OF SCI & TECH +1
View PDF6 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] For the above defects or improvement needs of the prior art, the object of the present invention is to provide a method and product and application for preparing a microneedle array template based on laser etching technology, wherein the key laser etching process conditions (including masking) Template setting, laser processing processing times, laser current, etc.) are improved, compared with the existing technology, it can effectively solve the problem of complex preparation process of microneedle array templates, high price, poor structural design and large-scale production and application of microneedle array templates. Difficult problem, able to rapidly prepare size-controllable polydimethylsiloxane (PDMS) microneedle array templates, so that soluble polymer microneedles of different sizes can be prepared

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for producing micro-needle array templates based on laser etching technology as well as products and application thereof
  • Method for producing micro-needle array templates based on laser etching technology as well as products and application thereof
  • Method for producing micro-needle array templates based on laser etching technology as well as products and application thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0038] The preparation method of the microneedle array template prepared by laser etching technology provided by the present invention usually includes the following steps:

[0039] (1) Preparation of PDMS substrate: Put PDMS and its curing agent (such as SYLGARD 184) in a plastic petri dish at a mass ratio of 20:1 to 5:1 and mix them thoroughly. The mass ratio can be preferably 10:1. Vacuumize at 0.08MPa to remove air bubbles in the mixture, heat and solidify at 70-90°C for 1 to 4 hours (or preferably heat and solidify at 80°C for 2 hours), and peel off after cooling;

[0040] (2) Design of laser etching mask: Use engraving machine drawing software to draw a 10×10 concentric circle array with a diameter of 50 to 500 μm and a pitch of 200 to 600 μm; the diameter may preferably be 50 to 300 μm, and more preferably 50 to 250μm, the spacing can be preferably 300-500μm;

[0041] (3) Etching of the microneedle template: Place the PDMS substrate obtained in step (1) horizontally on...

Embodiment 1

[0045] In this embodiment, the microneedle array template prepared based on laser etching technology was prepared according to the following method:

[0046] (1) Preparation of PDMS substrate: Put PDMS and its curing agent (such as SYLGARD 184) in a plastic petri dish at a mass ratio of 10:1 and mix them thoroughly, and vacuumize at -0.08MPa to remove the air bubbles in the mixture, 80 ℃ for heating and curing for 2 hours, and peel off after cooling to obtain the PDMS substrate required for laser etching;

[0047] (2) Design of laser etching mask: Use engraving machine drawing software to draw a 10×10 concentric circle array with a diameter of 150 μm and a pitch of 500 μm; taking any concentric circle in the concentric circle array as an example, the diameter here refers to The diameter corresponding to the circle with the largest diameter, the diameter of the circle with the smallest diameter among the concentric circles may be 50 μm.

[0048] (3) Etching of the microneedle ...

Embodiment 2

[0051] In this embodiment, the microneedle array template prepared based on laser etching technology was prepared according to the following method:

[0052] (1) Preparation of PDMS substrate: Put PDMS and its curing agent in a plastic petri dish at a mass ratio of 10:1 and mix them thoroughly, vacuumize at -0.08MPa to remove air bubbles in the mixture, heat and cure at 80°C for 2h, After cooling, peel off to obtain the PDMS substrate required for laser etching;

[0053] (2) Design of laser etching mask: use engraving machine drawing software to draw a 10×10 concentric circle array with a diameter of 150 μm and a pitch of 500 μm;

[0054] (3) Etching of the microneedle array template: place the PDMS substrate obtained in (1) horizontally on the PL-40 CO 2 In the engraving area of ​​the laser engraving machine, import the mask pattern obtained in (2) into the laser engraving software, set the laser current to 6mA, the laser scanning rate to 10cm / s and the number of laser proce...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Number average molecular weightaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for producing micro-needle array templates based on a laser etching technology as well as products and application thereof. The method comprises the following steps: (1) curing and cooling PDMS and a curing agent to obtain a PDMS substrate; (2) designing a laser etching mask plate pattern and enabling the pattern to be a concentric circle array; and (3) placing the PDMS substrate in an engraving area of a laser engraving machine and setting condition parameters of laser processing technology, subsequently carrying out laser treatment on the PDMS substrate with reference to the laser etching mask plate pattern so as to obtain the PDMS substrate etched by laser, wherein the PDMS substrate is the micro-needle array template. According to the method, the key laser etching process conditions are improved, so that the problems that the micro-needle array templates are complex in production process, high in cost and poor in structural design, and large-scale production and application of the micro-needle array templates are difficult can be effectively solved.

Description

technical field [0001] The invention belongs to the field of biomedical polymer materials, and more specifically relates to a preparation method for preparing a microneedle array template based on laser etching technology, a product thereof, and an application of the product in the preparation of soluble polymer microneedles. Background technique [0002] Microneedles are three-dimensional arrays made of silicon, metal, and polymers with a length of 25-2000 μm and tapered needle tips. Microneedle is a new type of minimally invasive drug delivery tool in the field of biomedicine, which can enhance the effect of skin drug delivery through the epidermis and dermis of the skin. Microneedles have been widely used in the field of transdermal drug delivery due to their advantages of high efficiency, safety, and painlessness. [0003] Soluble microneedles are microneedle arrays prepared by coating drugs in soluble or degradable polymer materials. The preparation method of soluble ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K9/00A61K47/34A61K47/36A61L31/06A61L31/04A61L31/14B23K26/362
CPCA61K9/0021A61K47/34A61K47/36A61L31/042A61L31/06A61L31/14B23K26/361C08L83/04C08L5/08
Inventor 朱锦涛李朝柳佩陶娟董励芸
Owner HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com