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Sapphire camera lens and manufacturing method thereof

A sapphire and camera technology, applied in the field of camera lenses, can solve the problems of low processing accuracy, affecting the photographing process, reducing the transmittance of incident light, etc., to achieve the effect of improving imaging clarity, reducing interference intensity, and increasing appearance aesthetics

Active Publication Date: 2017-02-22
广东中图半导体科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] 1. Compared with the refractive index n≈1.5 of ordinary glass, the refractive index of sapphire material is as high as n≈1.78. The high refractive index difference produces higher Fresnel reflection loss, thereby reducing the transmittance of incident light; in addition, the reflected light Affect the photo taking process, resulting in glare and unclear imaging
[0005] 2. The surface pattern of the traditional camera lens is mainly realized by using printing ink baking combined with metal deposition process. There are problems such as complex processing technology, easy to fall off pattern and monotonous color.
In addition, due to the low processing accuracy, it is impossible to realize nanoscale patterns on the surface of the lens whose size is comparable to the wavelength of visible light. Therefore, based on traditional processing technologies, it is difficult to obtain photonic crystal structural colors with strong three-dimensional effect and rich color.

Method used

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  • Sapphire camera lens and manufacturing method thereof
  • Sapphire camera lens and manufacturing method thereof
  • Sapphire camera lens and manufacturing method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0040] A method for preparing a sapphire camera lens. The sapphire camera lens is prepared by combining nanoimprinting and plasma dry etching, wherein the nearest neighbor distance of the anti-reflection nano-pattern array is 50nm-300nm, and the period of the photonic crystal is 300nm-2μm. , as attached image 3 As shown, it specifically includes the following steps:

[0041] S1, firstly polish the 2-4 inch sapphire substrate 2 on both sides, control the thickness of the polished sapphire substrate to 0.2mm-0.7mm, and clean and remove the pollutants on the surface of the sapphire substrate.

[0042] S2, spin coating a photoresist layer 5 suitable for UV nanoimprinting on the front side of the sapphire substrate 2, the thickness of the photoresist layer is 100nm-600nm, and the thickness of the photoresist layer depends on the etching resistance and antireflection of the glue itself The height of the nano-pattern bulge; put the sapphire substrate with a photoresist layer on the...

Embodiment 2

[0049] A method of realizing sapphire camera lens by using nanosphere self-assembly method, stepping photolithography method and plasma dry etching method, in which the nearest neighbor distance is 100nm by using nanosphere self-assembly method combined with plasma dry etching method The 300nm anti-reflection nano pattern array adopts the stepping photolithography method to prepare the photonic crystal structure with a period of 2μm-10μm, which specifically includes the following preparation steps:

[0050] S1, polishing a 2-4 inch sapphire substrate on both sides, controlling the thickness of the polished sapphire substrate to 0.2mm-0.7mm, cleaning and removing pollutants on the surface of the sapphire substrate.

[0051] S2, first SiO with a diameter of 100nm to 300nm 2 Nanosphere materials diluted into organic solvents and controlled SiO 2 The concentration and ratio of nanospheres; then immerse the sapphire substrate obliquely into the solvent, and deposit a single layer ...

Embodiment 3

[0058] The method of realizing sapphire camera lens by using anodic aluminum oxide (AAO) method, stepping photolithography method combined with plasma dry etching method, wherein the nearest neighbor spacing is 100nm~ by using AAO technology combined with plasma dry etching method The 300nm anti-reflection nano-pattern convex array adopts stepping photolithography technology to prepare a photoresist crystal structure with a period of 2 μm to 10 μm, which specifically includes the following preparation steps:

[0059] S1, polishing a 2-4 inch sapphire substrate on both sides, controlling the thickness of the polished sapphire substrate to 0.2mm-0.7mm, cleaning and removing pollutants on the surface of the sapphire substrate.

[0060] S2, using anodized aluminum oxide (AAO) method to prepare AAO thin film layer with nearest neighbor spacing of 100nm-300nm; use corrosion to separate AAO thin film layer from aluminum substrate, and conduct through-hole treatment; attach AAO thin fi...

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Abstract

The invention discloses a sapphire camera lens and a manufacturing method thereof. The sapphire camera lens comprises a sapphire substrate, wherein a front side of the sapphire substrate is provided with an anti-reflection nano graph array, a sapphire back side is provided with a center transparent area and a photonic crystal ornamental area, the center transparent area is arranged at a center area of the sapphire back side, the photonic crystal ornamental area is arranged at an area between an edge of the center transparent area and an edge of the sapphire substrate, the anti-reflection nano graph array, and the center transparent area and the photonic crystal ornamental area form a lens unit. According to the sapphire camera lens, the anti-reflection nano graph array is firstly made on the front side of the sapphire substrate, and the back surface of the sapphire substrate is provided with the center transparent area and the photonic crystal ornamental area. The sapphire camera lens has advantages of high transmissivity, strong stereo perception and abundant colors.

Description

technical field [0001] The invention belongs to the technical field of camera lenses, and specifically relates to a sapphire camera lens mainly used in mobile terminals such as mobile phones and tablet computers and a preparation method thereof. Background technique [0002] In recent years, mobile terminals such as smartphones and tablet computers have been widely promoted and used at home and abroad, and have become irreplaceable necessities in people's lives. Among them, the high-pixel camera function has become one of the indispensable standard functions of smartphones, so performance requirements such as high transmittance and high wear resistance have been put forward for the lens of the mobile phone camera. Due to its physical, chemical and optical properties such as high hardness, wear resistance and wide light transmission band, sapphire has been widely used as a high-end smartphone camera lens. In order to increase the aesthetic effect of the appearance of smartph...

Claims

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Application Information

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IPC IPC(8): G02B1/00G02B1/02G02B3/00
CPCG02B1/005G02B1/02G02B3/0012G02B3/0056
Inventor 付星星陆前军康凯陈振浩蓝文安
Owner 广东中图半导体科技股份有限公司
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