Hydrogen chloride gas purification method

A hydrogen chloride gas and purification method technology, applied in the direction of chlorine/hydrogen chloride purification, chlorine/hydrogen chloride, chemical instruments and methods, etc., can solve the problem that hydrogen chloride cannot effectively remove hydrogen sulfide and organic matter at the same time, and achieve easy large-scale application and operation simple effect

Inactive Publication Date: 2017-02-22
GUANGDONG GUANGSHAN NEW MATERIALS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] Aiming at the problem that existing hydrogen chloride purification or impurity removal methods cannot effectively remove hydrogen sulfide and organic matter and other components at the same time, the present invention provides a hydrogen chloride gas purification method

Method used

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preparation example Construction

[0091] The preparation method of modified mesoporous molecular sieve comprises the following steps:

[0092] (a) triethanolamine is mixed with ammonia water to make a mixed solution;

[0093] (b) Grind the M41S mesoporous molecular sieve into powder form, add it to the mixed solution prepared in step (a), mix and stir for the first time, then add ethyl orthosilicate to it, stir at constant temperature for the second time, pump Filter, wash, dry, and roast to obtain the modified M41S mesoporous molecular sieve carrier;

[0094] (c) loading the zinc salt on the modified M41S mesoporous molecular sieve carrier prepared in step (b), and calcining to obtain the modified M41S mesoporous molecular sieve loaded with ZnO as the carrier.

[0095] The manganese zeolite-loaded catalyst in step (2) consists of a carrier, an active component manganese zeolite and a catalytic assistant. The preparation method of the catalyst of described loaded manganese zeolite comprises the following ste...

Embodiment 1

[0100] This embodiment provides a modified mesoporous molecular sieve, which uses triethanolamine-modified M41S mesoporous molecular sieve as a carrier, and is loaded with 55 wt% ZnO of the modified mesoporous molecular sieve.

[0101] The preparation method of the modified mesoporous molecular sieve comprises the following steps:

[0102] (a) mixing triethanolamine and aqueous ammonia with a concentration of 8wt% at 23°C to prepare a mixed solution, wherein the concentration of triethanolamine is 45wt%;

[0103] (b) Grind M41S mesoporous molecular sieves (calcined at 500°C to 550°C for 3h to 4h) with 4 times the mass of triethanolamine until powdery, add to the mixed solution prepared in step (a), and heat at 50°C to 55°C Constant mixing and stirring for the first time for 30min to 40min, then add tetraethyl orthosilicate which is 3 times the mass of triethanolamine, and then constant mixing and stirring for the second time at 50 to 55°C for 30min to 40min, suction filtration...

Embodiment 2

[0106] This embodiment provides a modified mesoporous molecular sieve, which uses triethanolamine-modified M41S mesoporous molecular sieve as a carrier, and is loaded with 50 wt% ZnO of the modified mesoporous molecular sieve.

[0107] The preparation method of the modified mesoporous molecular sieve comprises the following steps:

[0108] (a) mixing triethanolamine with ammonia water at a concentration of 5wt% at 20°C to prepare a mixed solution, wherein the concentration of triethanolamine is 40wt%;

[0109] (b) Grind the M41S mesoporous molecular sieve (calcined at 450°C to 500°C for 3h to 4h) with 5 times the mass of triethanolamine until it is powdered, add it to the mixed solution prepared in step (a), and heat it at 45°C to 50°C Constantly mix and stir for 40-50min for the first time at ℃, then add tetraethyl orthosilicate which is 4 times the mass of triethanolamine to it, and then constant-mix and stir for 40min-50min for the second time at 45℃-50℃, suction filter, wa...

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Abstract

The invention provides a hydrogen chloride gas purification method which includes the steps: (1) contacting hydrogen chloride gas to be treated with modified mesoporous adsorbents at the temperature ranging from 50 DEG C to 200 DEG C, and removing hydrogen sulfide to obtain hydrogen chloride gas after removing the hydrogen sulfide; (2) performing catalytic oxidation for the hydrogen chloride gas after removing the hydrogen sulfide obtained in the step (1) by catalyst loading manganese zeolite, removing organic matters, and removing water and CO2 by adsorbents to prepare the hydrogen chloride gas. According to the purification method, hydrogen sulfide components in the hydrogen chloride gas are removed by the aid of the modified mesoporous adsorbents, the hydrogen chloride gas after removing the hydrogen sulfide is catalyzed and oxidized by the aid of the catalyst loading the manganese zeolite, the organic matters in the hydrogen chloride gas after removing the hydrogen sulfide are removed, high-purity hydrogen chloride gas can be obtained, the whole purification process is simple to operate, and the purification method is easily and massively applied in industries.

Description

technical field [0001] The invention belongs to the field of waste gas treatment, and relates to a method for purifying hydrogen chloride gas, in particular to a method for purifying hydrogen chloride gas containing hydrogen sulfide and organic matter. Background technique [0002] With the development of the chemical industry and the improvement of human living standards, people pay more and more attention to the treatment of organic pollutants. The existence of organic pollutants will affect the quality of subsequent products and reduce the purity of products; in addition, the volatilization of organic pollutants is the culprit of photochemical smog in addition to toxicity or stench. [0003] In the production process of organic matter (such as phosphazene compounds, halogen-free flame retardants and methyl chloride, etc.), a large amount of hydrogen chloride gas is often produced, and these hydrogen chloride gases are also mixed with many other gas impurities, such as hyd...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/02B01D53/86B01D53/44B01J20/18B01J20/30C01B7/07B01J29/076
CPCB01D53/02B01D53/8687B01D2253/108B01D2255/2073B01D2255/50B01D2257/304B01D2257/504B01D2257/80B01J20/186B01J29/076B01J2229/183C01B7/0718Y02C20/40Y02P20/151
Inventor 潘庆崇
Owner GUANGDONG GUANGSHAN NEW MATERIALS CO LTD
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