Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A cloud computing-based intelligent attendance management method and system

A technology of attendance management and cloud computing, applied in computing, data processing applications, recording/indicating event time, etc., can solve problems such as low efficiency, high cost, and inability to meet the high requirements of massive attendance data processing speed, and achieve efficiency High, low cost, and reduce the effect of sorting workload

Active Publication Date: 2018-07-24
HESHI OFFICE EQUIP
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the existing attendance management system generally requires enterprises to deploy dedicated server equipment, and requires professional personnel to manage and maintain, which is costly and inefficient
With the advent of the Internet + era, the attendance data that the attendance management system needs to process has shown a blowout growth. The existing attendance management system can no longer meet people's high requirements for the processing speed of massive attendance data.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A cloud computing-based intelligent attendance management method and system
  • A cloud computing-based intelligent attendance management method and system
  • A cloud computing-based intelligent attendance management method and system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0072] Aiming at the high cost and low efficiency of attendance management in the prior art, which cannot meet people's high requirements for processing massive attendance data, the present invention proposes a brand-new intelligent attendance management method and system based on cloud computing.

[0073] The specific implementation process of the intelligent attendance management method based on cloud computing of the present invention comprises the following steps:

[0074] (1) Construct a cloud attendance architecture consisting of infrastructure layer, platform layer and software application layer, and obtain the required attendance data and location data through the infrastructure layer.

[0075] The cloud attendance framework of the present invention is as follows: figure 2 As shown, it consists of infrastructure layer, platform layer and software application layer.

[0076] Among them, the infrastructure layer is a collection of virtualized hardware resources and rel...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an intelligent work attendance management method and system based on cloud computing. The method comprises the following steps: constructing a cloud work attendance framework composed of an infrastructure layer, a platform layer and a software application layer and acquiring needed work attendance data and position data via the infrastructure layer; and carrying out intelligent work attendance management and analysis according to the constructed cloud work attendance framework and the acquired data so as to output evaluation, tendency description, rule description and scores of people attending work. According to the invention, the cloud work attendance framework composed of the infrastructure layer, the platform layer and the software application layer is constructed, work attendance management services are implemented through a cloud platform, so cost is low and efficiency is high; the infrastructure layer employs a server cluster, a distributed memory system and a big data management system, so the processing speed of mass work attendance data can be greatly increased; and the platform layer can provide work attendance data parallel processing service based on MapReduce, so the processing speed of the mass work attendance data is further improved. The intelligent work attendance management method and system can be extensively applied to the field of work attendance.

Description

technical field [0001] The invention relates to the field of attendance, in particular to a cloud computing-based intelligent attendance management method and system. Background technique [0002] An important part of enterprise and business management is its personnel attendance system. Its quality directly affects the unit's economic and social benefits, as well as employees' salaries and many other aspects. Therefore, effective and scientific management of employee attendance has become an important issue for each unit. [0003] With the relatively mature development of attendance technology, many attendance systems have emerged. The attendance system is integrated with advanced computer attendance management software. The attendance management system is used to manage the attendance of employees within the enterprise, such as commuting, being late, leaving early, asking for leave, taking vacations, working overtime, etc. It is an important means for enterprises to coun...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G07C1/10G06Q10/06
CPCG06Q10/06398G07C1/10
Inventor 贺月路周荣华钟进堂全晓峰
Owner HESHI OFFICE EQUIP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products