Liquid gasification device and gasification method thereof

Abstract

The invention provides a liquid gasification device and a gasification method thereof. The liquid gasification device comprises a first pipe body, a second pipe body, an atomizer, a gasifier inner shell, an electric heater, a third pipe body and a gasifier outer shell, wherein the first pipe body is connected with a first access pipe and a second access pipe, the second pipe body is connected with the first pipe body, the atomizer is located at the junction of the first pipe body and the second pipe body, the gasifier inner shell is connected with the second pipe body, the electric heater is partially contained in the gasifier inner shell and used for heating the gasifier inner shell, the third pipe body is connected with the bottom of the electric heater and communicates with the gasifier inner shell, and the gasifier outer shell is located outside the third pipe body; and a plurality of capillary tubes which are distributed in a concentric circle mode, thermoelectric couples located between the multiple capillary tubes, and heat-conducting grease located between every two adjacent capillary tubes are arranged in the gasifier inner shell. According to the liquid gasification device and the gasification method thereof, the grease serves as a heat source and is from the outside, so that a temperature control point is located in the middle of the grease, and accordingly the effect that the grease temperatures in all positions are not lower than a set value is guaranteed; and the heater does not make contact with liquid directly, so that the phenomena of local overheating and scaling are avoided, and evaporation is stable.

Description

technical field [0001] The invention belongs to the technical field of optical fiber preform rods, and in particular relates to a liquid gasification device and a gasification method thereof. Background technique [0002] In the existing optical fiber preform manufacturing methods, such as MCVD (Metal Chemical Vapor Deposition, metal chemical vapor deposition), PCVD (Plasma Assisted Chemical Vapor Deposition, plasma enhanced chemical vapor deposition method), VAD (Vapor Phase Axial Deposition Technique, vapor phase axial deposition method) and OVD (Outside Vapor Deposition, external vapor phase deposition method) both use liquid raw materials such as SiCl4, GeCl4, BBr3, POCl3, OMCTS, etc. as raw materials for gasification reactions. It is well known that in the manufacturing process of optical fiber preform, the stability of vaporization of liquid raw materials has a great influence on the deposition parameters and product quality of the product. [0003] At present, the ga...

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Problems solved by technology

[0005] The object of the present invention is to provide a liquid gasification device and its gasification method that solve the problems of unstable gas point of gasification liquid, local overheating, and easy fouling of heating parts

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