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Method for enhancing plasma spectrum of fused silica induced by femtosecond laser double pulses

A plasma spectroscopy, femtosecond laser technology, applied in thermal excitation analysis, material excitation analysis, instruments, etc., can solve the problems of weak intensity, low energy consumption, short action time of femtosecond pulsed laser, etc.

Inactive Publication Date: 2016-07-20
BEIJING INSTITUTE OF TECHNOLOGYGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When processing with femtosecond pulsed laser, since the laser pulse width is 10 -15 On the order of seconds, which is much shorter than the energy release time of the excited electrons in the material, the laser interacts with the matter in a very short time interval and in a very small area, which hardly produces energy diffusion and has almost no effect on the periphery of the processing area; in addition , due to the short action time of the femtosecond pulse laser, it can obtain extremely high peak power, and can process almost any substance. Therefore, femtosecond pulse laser processing has high three-dimensional spatial resolution, low energy consumption, and low thermal effect. Obvious defects of short processing plasma lifetime and weak intensity, especially evident in induced breakdown spectroscopy measurements of dielectric materials

Method used

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  • Method for enhancing plasma spectrum of fused silica induced by femtosecond laser double pulses
  • Method for enhancing plasma spectrum of fused silica induced by femtosecond laser double pulses
  • Method for enhancing plasma spectrum of fused silica induced by femtosecond laser double pulses

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Embodiment 1

[0025] Firstly, a traditional femtosecond laser pulse is used to induce the fused silica to produce a plasma radiation spectrum, and its spectral intensity is measured. The specific processing and spectral collection methods are as follows:

[0026] (1) Turn on the femtosecond laser 1, turn on the first mechanical switch 2, and turn off the second mechanical switch 3. At this time, only the transmitted sub-pulse can be focused on the sample surface for processing. Adjust the optical path to ensure that the laser incident direction is perpendicular to the processed sample surface .

[0027] (2) By adjusting the combined angle of the half-wave plate 9 and the polarizer 10, the power of the traditional laser single pulse before focusing is adjusted to 30mW-100mW, and the diameter of the focal spot after passing through the plano-convex lens with a focal length of 100mm is about 34μm. The amount is about 3.3~11J / cm 2 .

[0028] (3) The computer 17 controls the three-dimensional ...

Embodiment 2

[0031] Taking the femtosecond laser double pulse as an example below, the effect of femtosecond laser double pulse-induced enhancement of the spectral intensity of the fused silica plasma radiation is illustrated.

[0032] The method for enhancing the radiation spectrum of the fused silica plasma ablated by the femtosecond laser pulse sequence proposed by the present invention, the specific processing steps are as follows:

[0033] (1) Turn on the femtosecond laser 1, turn on the first mechanical switch 2, and turn on the second mechanical switch 3. At this time, the transmission sub-pulse and the reflection sub-pulse are combined and focused on the surface of the sample for processing, and the optical path is adjusted to ensure the incident direction of the laser. perpendicular to the surface of the processed sample.

[0034] (2) By adjusting the combined angle of the half-wave plate 9 and the polarizer 10, the power of the traditional laser single pulse before focusing is ad...

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Abstract

The invention relates to a method for enhancing a plasma spectrum of fused silica induced by femtosecond laser double pulses, in particular to the method for carrying out ultrafast repetitive ablation on the fused silica by using the femtosecond laser double pulses to improve the radiation spectral intensity of a producing plasma, and belongs to the technical field of femtosecond laser application. The conventional femtosecond laser single pulse is modulated to the femtosecond laser double pulses, and the local transient electron dynamic state of the processed fused silica is regulated in the scale of subpicoseconds to hundred picoseconds to change the temperature and electron number density of the induced fused silica plasma and finally improve the spectral radiation intensity of the plasma. Furthermore, compared with the conventional femtosecond laser single pulse, the radiation spectral intensity can be enhanced by multiple times.

Description

technical field [0001] The invention relates to a method for enhancing the plasma spectrum of fused silica induced by double pulses of femtosecond laser, in particular to a method for using double pulses of femtosecond laser to perform ultrafast repeated ablation of fused silica, thereby increasing the intensity of the radiation spectrum of the produced plasma , belongs to the field of femtosecond laser application technology. Background technique [0002] Laser-induced breakdown spectroscopy has great application potential in micro-nano processing. Laser-induced breakdown spectroscopy is an element detection method based on atomic emission spectroscopy and laser plasma emission spectroscopy. Its basic principle is that when a test sample is ablated by a laser pulse, a plasma characteristic spectrum carrying sample element information will be generated. According to These spectra allow qualitative and quantitative analysis of the elements contained in the sample. Laser-ind...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/71
CPCG01N21/71G01N2201/06113
Inventor 姜澜曹志涛王素梅王猛猛杨帆
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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