Preparation method of nalmefene hydrochloride monohydrate
A technology of nalmefene hydrochloride and monohydrate, which is applied in the field of preparation of nalmefene hydrochloride monohydrate, can solve the problems of poor stability and low yield of nalmefene hydrochloride monohydrate, and achieve good stability and improved Yield effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0014] 5.0g nalmefene hydrochloride sample (moisture content 3.57%) was dispersed with 50ml dichloromethane, slowly dripped into 2.4g purified water under stirring, heated to reflux for 1h, then cooled to 10-15°C for filtration, and the filter cake was dried at 40°C to Constant weight was obtained to obtain nalmefene hydrochloride monohydrate, the yield was 4.68g, the water content was 5.23%, and the yield was 92.0%.
Embodiment 2
[0016] 5.0g nalmefene hydrochloride sample (moisture content 3.57%) was dispersed in 50ml dichloromethane, slowly dripped into 1.2g purified water under stirring, heated to reflux for 1h, then cooled to 10-15°C for filtration, and the filter cake was dried at 40°C to Constant weight was obtained to obtain nalmefene hydrochloride monohydrate, the yield was 4.66g, the water content was 5.11%, and the yield was 91.7%.
Embodiment 3
[0018] 5.0g nalmefene hydrochloride sample (moisture content 3.57%) was dispersed in 50ml dichloromethane, slowly dripped into 3.6g purified water under stirring, heated to reflux for 1h, then cooled to 10-15°C for filtration, and the filter cake was dried at 40°C to Constant weight was obtained to obtain nalmefene hydrochloride monohydrate, the yield was 4.48g, the water content was 5.25%, and the yield was 88.0%.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com