A metal-doped amorphous carbon thin film temperature sensing element and its preparation method
A technology of sensing elements and metal doping, applied in thermometers, thermometers with directly heat-sensitive electric/magnetic elements, instruments, etc., can solve the problem of not having high TCR, high room temperature resistivity, poor adhesion, etc. at the same time question
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Embodiment 1
[0041] In this embodiment, the structure of the temperature sensing element is as follows figure 1 shown by Al 2 o 3 Composed of substrate 1, tungsten-doped amorphous carbon film 2 and silver colloidal electrode 3, tungsten-doped amorphous carbon film 2 is located on Al 2 o 3 On the surface of the substrate 1 , the silver glue electrode 3 is located on the surface of the tungsten-doped amorphous carbon film 2 .
[0042] Tungsten-doped amorphous carbon film 2 composed of C diamond phase sp 3 and graphite phase sp 2 Hybrid state, tungsten atoms and / or tungsten carbides, and H atoms, where tungsten atoms and / or tungsten carbides are distributed in sp 2 covalent bond and sp 3 The irregular carbon space network matrix structure formed by covalent bonds.
[0043] The preparation method of the temperature sensing element comprises the following steps:
[0044] (1)Al 2 o 3 The substrate was ultrasonically cleaned with ethanol, dried and placed in a vacuum chamber, pre-evacua...
Embodiment 2
[0052] In this embodiment, the structure of the temperature sensing element is completely the same as that in Embodiment 1.
[0053] In this embodiment, the preparation method of the temperature sensing element is basically the same as that in Embodiment 1, except that the magnetron sputtering target current in step (2) is 1.8A.
[0054] Same as in Example 1, using the four-point method, the relationship between the resistivity of the above-mentioned prepared temperature sensing element in the range of 278K to 368K as a function of temperature was tested by a comprehensive physical property measurement system (Physical PropertyMeasurement System, PPMS), and the results are as follows image 3 As shown, through the following formula:
[0055]
[0056] R0 is the resistance value at the initial temperature T0, R is the film resistance value at the temperature T, and the TCR value can be obtained to be about 235ppmK -1 .
Embodiment 3
[0058] In this embodiment, the structure of the temperature sensing element is as follows figure 1 shown by Al 2 o 3 Composed of substrate 1, copper-chromium co-doped amorphous carbon film 2 and silver glue electrode 3, copper-chromium co-doped amorphous carbon film 2 is located on Al 2 o 3 On the surface of the substrate 1, the silver glue electrode 3 is located on the surface of the copper-chromium co-doped amorphous carbon film 2.
[0059] CuCr-doped amorphous carbon film 2 composed of C diamond phase sp 3 and graphite phase sp 2 Hybrid state, copper, chromium atoms and / or copper chromium carbides, and H atoms, where copper chromium atoms and / or copper chromium carbides are distributed in sp 2 covalent bond and sp 3 The irregular carbon space network matrix structure formed by covalent bonds.
[0060] The preparation method of the temperature sensing element comprises the following steps:
[0061] (1)Al 2 o 3 The substrate was ultrasonically cleaned with ethanol, ...
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