Method for regenerating glass polishing solution and glass polishing apparatus

A grinding device and technology for grinding liquid, applied in the regeneration method of glass grinding liquid, regeneration device, glass substrate manufacturing device, and the field of glass substrates used in the field of glass substrates, can solve the problems of time and economy that cannot be said to be optimal, and it is difficult to achieve uniform thickness. Problems such as difficulty in thickness control

Active Publication Date: 2016-01-06
PANASONIC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

"Mechanical grinding" is to cut the glass by physical action, so it is difficult to control the thickness, and it is usually difficult to achieve a uniform thickness
In addition, "mechanical grinding" usually requires two stages of rough grinding and mirror grinding, which cannot be said to be optimal in terms of time and economy.

Method used

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  • Method for regenerating glass polishing solution and glass polishing apparatus
  • Method for regenerating glass polishing solution and glass polishing apparatus
  • Method for regenerating glass polishing solution and glass polishing apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0165] In the glass grinding method and device of the present invention, the grinding object is aluminoborosilicate glass. More specifically, for SiO 2 as the main body, containing Al 2 o 3 , B 2 o 3 , BaO, CaO, MgO, Na 2 O, SrO, strengthened glass with high tensile strength and high softening point. Glass containing aluminum may also be used. Hereinafter, it is also referred to as "Al-containing glass". The polishing solution is mainly composed of hydrofluoric acid, and contains inorganic acids such as hydrochloric acid, nitric acid, and sulfuric acid. Moreover, additives, such as a surfactant, an antifoaming agent, and a chelating agent, may be contained.

[0166] Sludge generated when aluminoborosilicate glass is polished is a substance precipitated from the polishing solution in a complex formed by bonding elements in the aluminoborosilicate glass to fluorine derived from hydrofluoric acid in the polishing solution . The inventors of the present applica...

Embodiment approach 2

[0263] In the glass polishing device 1 described in Embodiment 1, an Al-F complex removal device 21 is constituted by a reaction tank 20 and a metal salt addition part 22 for removing Al. This is considered to be because not even a small amount of sludge remains in the storage unit 12 in which the polishing liquid circulates is effective in reducing defective products. That is, it is considered that when sludge remains in the polishing liquid, the sludge remains on the glass surface during polishing, which forms a sludge trace and causes quality deterioration.

[0264] However, the polishing liquid is sprayed to the surface of the glass to be polished so as to advance uniformly, or the glass is immersed in the polishing liquid. Furthermore, washing with water was also performed after grinding|polishing. Therefore, it is considered that even if mud is mixed in the polishing liquid, it is difficult to remain as mud marks only after reaching the glass surface. This is becau...

Embodiment

[0392] Various tests were conducted in order to confirm the effectiveness of the present invention.

[0393] "Confirmation of the aggregation of sludge by adding a coagulant to a slurry containing sludge and the formation of aggregates and their sedimentation"

[0394] In order to confirm the aggregation of the sludge by the addition of the coagulant, the formation of aggregates, and its sedimentation, add 1 mL of Aqueous solutions containing the following coagulants at a concentration of 0.1% by weight, respectively. It should be noted that the concentration of the coagulant in the grinding liquid after adding the coagulant is 20 mg / L (or 0.13 mg / 100 mg·DS).

[0395] Coagulant 1: Polyacrylamide-based polymer (Accofloc N-100S manufactured by MTAQUAPOLYMER, Inc.: nonionic polymer, acrylamide polymerized unit: 100%, pH of aqueous solution: 5 to 7, molecular weight: 13 million, 0.1% by weight solution Viscosity: 20mPa / s(25℃))

[0396] Coagulant 2: Sodium polyacrylate...

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Abstract

When alumino-borosilicate glass is polished using a polishing solution containing hydrofluoric acid as a main component, sludge is generated on a glass surface or in a retention unit and pipes of a polishing apparatus, leading to a decrease in quality and stoppage of the apparatus. A glass polishing method in which Al-containing glass is polished using a polishing solution containing hydrofluoric acid, wherein the method is characterized in comprising a step of solidifying Al dissolved in a polishing solution that has been used to polish the glass and obtaining a reacted polishing solution, a step of separating the reacted polishing solution into solid and liquid to yield a regenerated polishing solution, and a step of polishing the glass using the regenerated polishing solution. In the glass polishing method, an Al-F complex, which is a substance contributing to forming sludge, is removed through forcible solidification, which makes it possible to suppress the generation of sludge on the glass surface or in individual sections of the polishing apparatus even if the polishing solution is circulated on use.

Description

technical field [0001] <Technical Field 1> The present invention relates to a method and an apparatus for polishing glass as an Al-containing component with a polishing liquid containing hydrofluoric acid. [0002] <Technical field 2> Moreover, this invention relates to the manufacturing method of a glass substrate, and the manufacturing apparatus of a glass substrate. In more detail, it is related with the method for manufacturing the glass substrate used for a display etc., and the apparatus used for this method. [0003] <Technical field 3> Moreover, this invention relates to the regeneration method and regeneration apparatus of a glass polishing liquid. More specifically, the present invention relates to a regeneration method for reusing a used polishing liquid used for polishing a glass substrate for a display, and an apparatus used for the method. Background technique [0004] <Background Art 1> [0005] In recent years, liquid crystal displa...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00C02F1/58C02F1/60
Inventor 岛田和哉爱甲雅彦铃木靖纪家田智之深谷泰史三好雄三清水勇斗
Owner PANASONIC CORP
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