Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Three-dimensional photoetching rapidly-formed hybrid polysiloxane-based photosensitive resin composition and preparation method and application thereof

A polysiloxane epoxy resin, polysiloxane-based technology, applied in the field of stereolithography rapid prototyping polysiloxane-based photosensitive resin composition and preparation thereof

Inactive Publication Date: 2016-01-06
QINGDAO UNIV OF SCI & TECH
View PDF5 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Specific to stereolithography rapid prototyping polysiloxane-based photosensitive resin and its preparation have not been reported

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] In a 5000ml glass three-neck flask equipped with a stirrer and a condenser, add 1042g of allyl glycidyl ether modified polysiloxane (molecular weight: about 500), γ-methacryloxypropyl polysiloxane Siloxane (molecular weight around 50000) 720.0g, allyl glycidyl ether modified polysiloxane (polymerization degree 5) 480.0g diluent low polymerization degree, tripropylene glycol diacrylate 480.0g, benzene 64 grams of methyl formylformate, 96 grams of bis-2,6-difluoro-3-pyrrolephenyl titanocene. Heat and stir until it becomes a transparent light yellow homogeneous liquid, which is a prepared photosensitive resin.

Embodiment 2

[0028] In a 5000 ml glass three-neck flask equipped with a stirrer and a condenser, add 2,3-epoxy-5-vinyl norbornene modified polysiloxane (molecular weight about 50000) 2000g, acryloxypropane 1000g of polysiloxane (molecular weight: about 500) based on diluent, 500g of 2,3-epoxy-5-vinyl norbornene modified polysiloxane (polymerization degree of 20) as diluent, 2,4 , 6-trimethylbenzoyl-diphenylphosphine oxide 100g, triaryl sulfonium hexafluorophosphate 100g. Heat and stir until it becomes a transparent light yellow homogeneous liquid, which is a prepared photosensitive resin.

Embodiment 3

[0030] In a 5000 ml glass three-neck flask equipped with a stirrer and a condenser, add 1500.0 g of 4-vinyl oxide cyclohexene modified polysiloxane (molecular weight about 30000), polymethacryloxypropyl Siloxane (molecular weight about 12000) 1200.0g, diluent 4-vinyl oxide cyclohexene modified polysiloxane with low polymerization degree (polymerization degree is 10) 800.0g, trimethylol tetrakis(methyl) ) Acrylate 300.0g, 4-methylbenzophenone 65.0g, 10-(4-biphenyl)-2-isopropylthioxanthone hexafluorophosphate 75.0g. Heat and stir until it becomes a transparent light yellow homogeneous liquid, which is a prepared photosensitive resin.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a three-dimensional photoetching rapidly-formed hybrid polysiloxane-based photosensitive resin composition and a preparation method and application thereof. The three-dimensional photoetching rapidly-formed hybrid polysiloxane-based photosensitive resin composition mainly comprises the following raw materials based on mass ratio: 20-70% of polysiloxane epoxy resin, 10-45% of polysiloxane acrylic ester, 1.0-4.0% of radical initiator, 1.0-6.0% of cationic initiator and 10-60% of polysiloxane diluents. The three-dimensional photoetching rapidly-formed hybrid polysiloxane-based photosensitive resin composition is obtained by mixing the raw materials and heating the mixture into a transparent liquid under stirring according to the above proportions. The three-dimensional photoetching rapidly-formed hybrid polysiloxane-based photosensitive resin composition disclosed by the invention can develop the characteristic of rapid forming of photosensitive resin and also has the characteristic of high- and low-temperature resistance of polysiloxane after three-dimensional photoetching forming. The part formed by using the photosensitive resin has the advantages of high accuracy, favorable heat resistance and the like.

Description

technical field [0001] The invention belongs to the technical field of 3D printing rapid prototyping manufacturing, and in particular relates to a stereolithography rapid prototyping polysiloxane-based photosensitive resin composition and a preparation method thereof. Background technique [0002] 3D printing technology is a technology that uses bondable materials such as powdered metal or plastic to construct objects by layer-by-layer printing based on digital model files. At the same time, 3D printers appeared in the mid-1990s, a rapid prototyping device that uses technologies such as light curing and paper lamination. Its working principle is basically the same as that of ordinary printers. The printer is filled with liquid or powder "printing materials". Now this technology is used in many fields, people use it to make clothing, architectural models, cars, chocolate desserts and so on. [0003] The working principle of 3DP is similar to inkjet printing. It is a rapid p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F7/075
Inventor 马凤国魏燕彦林润雄
Owner QINGDAO UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com