Double-temperature-zone baking device for split type dewar exhaust and realization method thereof

A baking device and dual temperature zone technology, which is applied in the field of packaging of infrared detector Dewar components, can solve the problems of shortening the exhaust time of Dewar ultra-high vacuum and insufficient exhaust effect, and achieve simple structure and low price , the effect of convenient operation

Active Publication Date: 2015-12-16
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0004] The purpose of this patent is to provide a dual-temperature-zone baking device for the ultra-high vacuum exhaust of the split-type infrared detector Dewar assembly, which solves the problem of single-temperature baking of the infrared detector Dewar assembly in ultra-high vacuum. To solve the problem of insufficient gas effect, improve the vacuum life of Dewar components, and at the same time appropriately shorten the exhaust time of Dewar ultra-high vacuum

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  • Double-temperature-zone baking device for split type dewar exhaust and realization method thereof
  • Double-temperature-zone baking device for split type dewar exhaust and realization method thereof
  • Double-temperature-zone baking device for split type dewar exhaust and realization method thereof

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[0073] The specific implementation of this patent will be further described in detail below in conjunction with the accompanying drawings. Such as figure 1 As shown, its main implementation method is as follows:

[0074] 1. The preparation method of each part in this patent:

[0075] 1) if figure 2 As shown, the cold chain seat 1 is made of oxygen-free copper material, which is a cylindrical part, and the inner and outer surfaces are polished. After polishing, it is cleaned in an ultrasonic cleaner with acetone, alcohol and deionized water for 5-10 minutes to remove the residues in the process. Grease and debris on part surfaces; see figure 2 , where D1=9mm, D2=20mm, upper tolerance is -0.06mm, lower tolerance is -0.02mm, D3=21mm, D4=20.4mm, D5=20mm, upper tolerance is +0.06mm, lower tolerance is +0.02mm ;H1=1mm, H2=4mm, H3=12.2mm, H4=5.7mm, H5=6.2mm;

[0076] 2) if image 3 As shown, the cold cap 2 is made of oxygen-free copper material, which is a cylindrical part, a...

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Abstract

The invention discloses a double-temperature-zone baking device for split type dewar exhaust and a realization method thereof. The structure of the device mainly consists of a cold chain base, a cold cap, a spring, an outer wall component, an inner wall component, heat conducting silicone grease, a rubber ring, a screw, an infrared detector dewar assembly, a dewar copper pipe, a heating mantle base plate, a platinum resistor, a heating element, a heating mantle, a thermal insulating layer, a water inlet pipe, a constant temperature circulator and a water outlet pipe. The double-temperature-zone baking device is simple in structure and low in cost, solves the problem of insufficient exhaust during the ultrahigh vacuum single temperature point baking of the infrared detector dewar assembly, and has the functions of prolonging the vacuum service life of dewars and at the same time properly shortening the ultrahigh vacuum exhaust time of the dewars.

Description

technical field [0001] The invention relates to an infrared detector Dewar assembly packaging technology, in particular to a dual-temperature zone baking device and a realization method for ultra-high vacuum exhaust of a separate infrared detector Dewar assembly. Background technique [0002] Vacuum life is an important technical indicator of Dewar components. Due to the inherent outgassing characteristics of materials, the vacuum degree in Dewar will continue to decrease as time goes by. When the vacuum degree drops to a certain level, the convective heat transfer of the residual gas causes a sharp increase in the heat load of the Dewar components. When the heat load increases to a certain level, the cooling capacity provided by the mechanical refrigerator cannot meet the requirements of the deep and low temperature work of the detector. The infrared detector cannot work at the necessary temperature point, and the residual gas in the Dewar will condense on the surface of th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F17C13/02F17C13/00G01J5/02
Inventor 张磊俞君曾智江王小坤孙闻李雪
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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