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Field emission electron gun baking device and baking method of electron gun chamber

A baking device and electron gun technology, which is applied in the direction of circuits, discharge tubes, electrical components, etc., can solve the problems of unstable electron beams and vacuum degrees that cannot meet the needs of electron guns, and achieve the effect of maintaining cleanliness and improving thermal conductivity

Active Publication Date: 2015-12-09
KYKY TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Therefore, the technical problem to be solved by the present invention is that the vacuum degree of the electron gun chamber in the existing scanning electron microscope cannot meet the use requirements of the electron gun, resulting in the technical defect that the electron beam emitted by the field electron gun is unstable, thereby providing a vacuum that can reduce the vacuum degree. stay at 10 -8 Pa, a baking device for a vacuum system that enables the electron gun to provide a more stable electron beam
[0006] Another technical problem to be solved by the present invention is that the vacuum degree of the electron gun chamber in the existing scanning electron microscope cannot meet the use requirements of the electron gun, resulting in the technical defect that the electron beam emitted by the field electron gun is unstable, thereby providing a vacuum degree that can reduce the vacuum degree. stay at 10 -8 Pa, a field emission electron gun baking device that enables the electron gun to provide a more stable electron beam

Method used

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  • Field emission electron gun baking device and baking method of electron gun chamber
  • Field emission electron gun baking device and baking method of electron gun chamber
  • Field emission electron gun baking device and baking method of electron gun chamber

Examples

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Embodiment 1

[0031] This embodiment provides a field emission electron gun baking device, which is used to bake the electron gun chamber 10 of the scanning electron microscope to increase the temperature in the electron gun chamber 10 .

[0032] refer to figure 1 , the field emission electron gun baking device of the present embodiment comprises at least one heat source 20, and this heat source 20 is arranged on the inside of the electron gun chamber 10, and the vacuum pumping assembly is connected with the electron gun chamber 10, and the position connected with the electron gun chamber 10 forms the pumping of the vacuum pumping assembly. breath. In the prior art, the heating of the electron gun chamber 10 generally adopts the method of wrapping a heating tape outside the electron gun chamber. The heating tape is made of resistance wire. After the heating tape is energized, the heat is transferred to the inside of the electron gun chamber 10 through the shell 11 of the electron gun chambe...

Embodiment 2

[0040] This embodiment provides a baking method for an electron gun chamber, which is used for baking and heating the interior of a scanning electron microscope or other vacuum containers. Specifically, the baking method includes the following steps:

[0041] Bake it inside the electron gun chamber 10 by using a heat source 20 to keep the temperature in the electron gun chamber 10 between 120°C and 180°C;

[0042] Vacuumize the electron gun chamber 10 using a vacuum assembly.

[0043] It should be noted that: the heat source 20 preferably bakes the electron gun chamber 10 under the condition that the electron gun chamber 10 is airtight, so that the vacuuming step of the vacuum assembly can be carried out synchronously with the baking of the heat source 20, so that more heat is obtained in the electron gun chamber 10. High level of vacuum.

[0044] Further, the heat selection 20 selects a halogen bulb, which utilizes the advantages of high heating efficiency of the halogen bul...

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Abstract

The invention discloses a field emission electron gun baking device and a baking method of an electron gun chamber. A heat source is arranged in the electron gun chamber, preferably is arranged close to related parts, and directly carries out thermal radiation on the parts, so that the heat-conducting efficiency is improved; gas molecules on the surfaces of the related parts fully escape; and when the electron gun chamber is in a working state, the vacuum degree in the electron gun chamber is not obviously reduced. In the existing technical solution, a gas is released by a resistance wire in the heating process; in order to avoid vacuum degree reduction in the electron gun chamber caused by the gas released by the resistance wire, the technical defects of low heating efficiency, insufficient temperature rise of partial parts and overheating of partial parts are generated due to the fact that the resistance wire can only be arranged outside the electron gun chamber. According to the field emission electron gun baking device disclosed by the invention, the technology bias is exactly overcome. The heat source is arranged in the electron gun chamber to bake the parts, so that the technical defect of poor thermal radiation effect due to the fact that a heating tape is adopted for heating in the prior art is overcome.

Description

technical field [0001] The invention relates to a baking device for a vacuum system, a field emission electron gun baking device and a baking method for an electron gun chamber, belonging to the technical field of vacuum equipment. Background technique [0002] Scanning electron microscope is an electron optical instrument, which uses focused electron beam to scan the surface of the sample line by line, so that the electron beam bombards the surface of the sample to generate secondary electrons, and uses the above secondary electrons to present the surface shape of the sample. The resolution of scanning electron microscope images can reach the nanometer level or even better than 1.0 nanometers, and it is widely used in new materials, new energy, national defense, scientific research and other fields. The above-mentioned focused electron beam is provided by the field emission electron gun on the scanning electron microscope. The field emission electron gun is a tiny high-brig...

Claims

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Application Information

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IPC IPC(8): H01J37/073H01J37/02
Inventor 孙占峰
Owner KYKY TECH
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