A recovery and treatment device for waste gas containing chlorosilane

A technology for recycling and processing chlorosilanes, applied in the directions of halosilanes, halogenated silicon compounds, lighting and heating equipment, etc., which can solve the problems of non-recyclability, pollution of the surrounding environment, and large amount of eluent, and improve the recycling rate. , Overcome technical deficiencies and achieve the effect of recycling

Active Publication Date: 2018-02-09
XINTE ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the waste liquid formed after leaching has a very high water content and is corrosive, which makes the transportation facilities easily damaged by corrosion, and the waste residue in the waste liquid is also easy to block the transportation pipeline, and the process of waste liquid transportation and manual slag removal is harmful to the surrounding environment. more serious pollution
In addition, the eluent (such as pure water or lye) used in the leaching process cannot be recycled, resulting in a huge amount of eluent, which increases the amount of waste liquid and the cost of treatment.

Method used

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  • A recovery and treatment device for waste gas containing chlorosilane
  • A recovery and treatment device for waste gas containing chlorosilane

Examples

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Embodiment 1

[0030] Such as figure 1 As shown, this embodiment provides a recovery and treatment device for chlorosilane-containing waste gas, including: a chlorosilane recovery unit, a chlorosilane washing unit and a tail gas venting unit.

[0031] Wherein, the chlorosilane waste gas includes nitrogen, hydrogen, hydrogen chloride gas, chlorosilane gas and impurities such as B and P, and the impurities such as B and P include: PCl 3 (phosphorus trichloride), PCl 5 (phosphorus pentachloride), BCl 5 (boron pentachloride) and PH 3(phosphine), and chlorides of B (boron), P (phosphorus); chlorosilane (chlorosilane) is silane (SiH 4 ) in which hydrogen atoms are replaced by chlorine atoms, which is a gas when the chlorine content is low, and a liquid when the chlorine content is high, and the general formula is SiH n Cl 4-n , n=0,1,2,3.

[0032] The chlorosilane recovery unit is connected with the chlorosilane washing unit, and is used for recovering part of the chlorosilane gas in the chl...

Embodiment 2

[0055] Such as figure 2 As shown, this embodiment provides a recycling and processing device for chlorosilane-containing waste gas, including: a frozen brine precooler 2, a booster 6, an absorption tower 8, a circulation pump 11, a deep cooler 12, a resin adsorption column 15, Mixing subunit 18, rinsing tower 19, stirring subunit 20, spray head 21, booster pump 24, water seal tank 28.

[0056] The operating principle of the recycling device is:

[0057] After the chlorosilane waste gas 1 enters the frozen brine precooler 2, part of the chlorosilane gas forms a chlorosilane condensate 3, and is delivered to the recovery system 4, while the remaining chlorosilane waste gas 5 (i.e. not described in Example 1) The chlorine-containing silane exhaust gas that forms condensate) enters the booster 6, and after being pressurized by the booster 6 to 0.05MPaG-0.2MPaG, it becomes a high-pressure exhaust gas 7. After the high-pressure exhaust gas 7 enters the absorption tower 8, it enter...

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Abstract

The invention provides a recycling and processing device for chlorosilane waste gas, comprising: a chlorosilane recovery unit, a chlorosilane rinsing unit and a tail gas venting unit, the chlorosilane recovery unit is connected with the chlorosilane rinsing unit, and is used to recover Part of the chlorosilane gas in the silane waste gas is recovered, and the remaining waste gas is sent to the chlorosilane washing unit; the chlorosilane washing unit is also connected with the tail gas venting unit, for the remaining chlorosilane gas in the remaining waste gas and The hydrogen chloride gas is washed down to remove the chlorosilane gas and hydrogen chloride gas in the remaining waste gas, and the remaining waste gas removed from the chlorosilane gas and hydrogen chloride gas is transported to the tail gas venting unit; the tail gas venting unit is used to remove the The remaining off-gases, cleaned of chlorosilane gases and hydrogen chloride gases, are vented. The recycling and processing device of the invention can not only fully recover the chlorosilane resources in the exhaust gas, but also perform pollution-free treatment on the unrecoverable chlorosilane in the exhaust gas.

Description

technical field [0001] The invention relates to the technical field of waste treatment, in particular to a recovery and treatment device for chlorosilane waste gas. Background technique [0002] In the polysilicon production process, due to production needs, each process unit (such as purification unit, reduction tail gas dry recovery unit, cold hydrogenation unit, reduction unit, tank farm, etc.) will inevitably emit a certain amount of tail gas (also known as exhaust gas). With the continuous expansion of the production scale of polysilicon, the emission of tail gas (mainly composed of nitrogen, hydrogen chloride, chlorosilane and hydrogen) will also increase sharply. On the one hand, a large amount of chlorosilane resources in the tail gas will be wasted; If it is leaked, it will cause serious pollution to the environment. Therefore, it is necessary to treat the tail gas formed in the polysilicon production process and then discharge it normally. [0003] At present, th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/107F25J3/00B01D53/18
Inventor 张旭
Owner XINTE ENERGY
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