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Production method of silver nanowire transparent conductive film

A technology of transparent conductive film and nano-silver wire, which is applied to the conductive layer, circuit, and electrical components on the insulating carrier, can solve the problems of large limitations of transparent conductive film of nano-silver wire, poor product function, and difficulty in popularization. Achieve the effects of good electrical conductivity, cost reduction, performance and yield improvement

Active Publication Date: 2015-10-21
城步新鼎盛电子科技有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Moreover, the surface hardness of the nano-silver wire transparent conductive film prepared on substrates such as transparent glass in the prior art is generally low (generally only up to 3-4H), and the wear resistance is not good enough. After yellow light (or laser) etching The formed transparent electrodes are easily broken due to slight physical damage or chemical damage, resulting in poor product function
Therefore, the nano-silver wire transparent conductive film produced by the prior art has great limitations in application and is difficult to popularize.

Method used

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  • Production method of silver nanowire transparent conductive film
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  • Production method of silver nanowire transparent conductive film

Examples

Experimental program
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Effect test

Embodiment 1

[0044] A production method of nano-silver wire transparent guide glass, comprising the following steps:

[0045] (1) Select the substrate: select a transparent glass sheet with a specification of 450mm×550mm×0.7mm;

[0046] (2) Prepare nano-silver wire suspension, adopt alcohol reduction method, mix silver nitrate, cupric chloride, polyvinylpyrrolidone and glycerol by the mass ratio of 1:0.0002:3:250 and inject in the reactor, react The kettle was evenly heated to about 200°C and continued to react for 4 hours. After natural cooling, silver nanowires with a diameter of 30-40 nanometers and a length of 10-30 μm were obtained. Then, by centrifugation, the solvent, dispersant and other impurities mixed in the silver nano wires are removed through secondary water purification and primary ethanol purification. Finally, the purified silver nanowires were stored in absolute ethanol.

[0047] (3) To prepare titanium dioxide sol, after mixing tetrabutyl titanate, ethanol and hydrochl...

Embodiment 2

[0056] A production method of nano-silver wire transparent guide glass, comprising the following steps: (1) selecting a base material: selecting a transparent glass sheet whose specification is 450mm×550mm×0.7mm;

[0057] (2) Prepare the nano-silver wire suspension, adopt the alcohol reduction method, mix the silver nitrate, copper chloride, polyvinylpyrrolidone and glycerol by the mass ratio of 1:0.0003:4:300 and inject it into the reactor, and the reaction The kettle is evenly heated to about 220° C., and the reaction is continued for 4 hours. After natural cooling, nano-silver wires with a diameter of 25-35 nanometers and a length of 10-20 μm are obtained. Then, by centrifugation, the solvent, dispersant and other impurities mixed in the silver nano wires are removed through secondary water purification and primary ethanol purification. Finally, the purified silver nanowires were stored in absolute ethanol.

[0058] (3) Prepare titania sol, adopt sol-gel method, after mixi...

Embodiment 3

[0065] Embodiment 3 A kind of production method of nano-silver wire conductive TFT

[0066] The main steps and methods of this embodiment are the same as those of Embodiment 1, the difference being:

[0067] (1) A TFT (Thin Film Transistor) sheet with a specification of 670mm×350mm×0.1mm is selected as the base material.

[0068] (2) Nano-silver wire coating solution and oxide sol must be coated on the front side of the TFT sheet.

[0069] (3) The baking temperature is 80-130° C., and the baking time is 150-240 minutes.

[0070] (4) The surface resistance of the finished product is 20-50 ohm / sq, and the surface hardness is 7-8H.

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Abstract

The invention provides a production method of a silver nanowire transparent conductive film. The production method comprises the steps of: preparing a silver nanowire coating liquid, and coating the silver nanowire coating liquid on a base material sheet to obtain a silver nanowire conductive coating; coating an oxide sol on the upper surface of the silver nanowire conductive coating to obtain an oxide protective layer; and forming the silver nanowire transparent conductive film on the base material sheet after baking and curing. The transmittance of the silver nanowire transparent conductive film prepared by adopting the method can reach 85 to 91%, the haze of the same is less than or equal to 2%, the surface resistivity of the same ranges from 10 to 200ohm / sq, and the surface hardness of the same ranges from 6 to 8H.

Description

technical field [0001] The invention relates to the technical field of transparent conductive films, in particular to a production method of nano-silver wire transparent conductive films. Background technique [0002] Transparent conductive films (TCFs) have high light transmittance in the visible light range (λ=380-780nm), excellent electrical conductivity (resistivity is generally lower than 10 -3 Ω·cm) film material. Transparent conductive films are widely used, mainly in the fields of optoelectronic devices such as transparent electrodes of liquid crystal displays, touch screens, and transparent electrodes of thin-film solar cells. Light transmittance and electrical conductivity are two mutually restraining indicators. Generally speaking, when the electrical conductivity increases, the light transmittance will decrease, and vice versa. Currently common transparent conductive films include ITO (Indium Tin Oxides tin-doped indium trioxide), GZO (Gallium Zinc Oxides galli...

Claims

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Application Information

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IPC IPC(8): H01B5/14H01B13/00
Inventor 周剑飞杨新湘
Owner 城步新鼎盛电子科技有限公司
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