A kind of preparation method and application of mud-resistant polycarboxylate superplasticizer
A technology of polycarboxylic acid and water-reducing agent, which is applied in the field of preparation of clay-resistant polycarboxylate water-reducing agent, can solve the problem of side chain entering into clay frame structure, poor clay resistance, poor plasticity retention over time, and mixing of water-reducing agent with water-reducing agent. To solve the problems of large amount, etc., to achieve the effect of shortening the synthesis time, high water reduction rate, and weakening the interspersed effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0029] The invention provides a preparation method of mud-resistant polycarboxylate superplasticizer, comprising:
[0030] Material preparation, butenol polyoxyethylene ether, acrylic acid, 4-vinyl benzoate, maleic anhydride-β-cyclodextrin, mercaptopropionic acid, ascorbic acid, sodium dithionite, and hydrogen peroxide in a mass ratio of 100 -130: 15-25: 1-5: 5-15: 0.1-10.0: 0.3-1.2: 0.1-1.0: 0.5-5.0;
[0031] Under normal temperature conditions of 5-35°C, mix and dissolve isobutylene alcohol polyoxyethylene ether and maleic anhydride-β-cyclodextrin in water to obtain an aqueous monomer solution with a mass concentration of (50-70)%;
[0032] Mix acrylic acid and 4-vinyl benzoate to form an aqueous solution with a mass concentration of (80-95)% to obtain a mixed solution of acrylic acid and 4-vinyl benzoate;
[0033] Adding (5-15)% of the mixed solution of acrylic acid and 4-vinylbenzoate to the aqueous monomer solution;
Embodiment 1
[0043]18.0 g of acrylic acid was mixed with 4.0 g of 4-vinyl benzoate, and deionized water was added to prepare solution A with a concentration of 80%.
[0044] 0.7 g of ascorbic acid was mixed with 1.0 g of mercaptopropionic acid, and deionized water was added to prepare solution B with a concentration of 5%.
[0045] Mix 3.0 g of sodium dithionite with 7.0 g of deionized water to prepare solution C with a concentration of 30%.
[0046] At room temperature of 20°C, 120.0g of isobutenol polyoxyethylene ether with a molecular weight of 2400 and 7.0g of maleic anhydride-β-cyclodextrin were added to the reactor, and then 98.0g of deionized water was added to prepare a monomer mass concentration of 56% macromonomer solution, then add 3.0g solution A, after stirring evenly, add 3.0g 27.5% hydrogen peroxide solution. After the above mixture was stirred for 10 minutes, solution B, the remaining solution A and solution C were added dropwise under nitrogen protection, and the addition...
Embodiment 2
[0048] 21.0 g of acrylic acid was mixed with 2.5 g of 4-vinyl benzoate, and deionized water was added to prepare solution A with a concentration of 85%.
[0049] Mix 0.5 g of ascorbic acid and 0.5 g of mercaptopropionic acid, and add deionized water to prepare solution B with a concentration of 2.5%.
[0050] Mix 1.5 g of sodium dithionite with deionized water to prepare solution C with a concentration of 35%.
[0051] At room temperature at 5°C, add 130.0 g of isobutenol polyoxyethylene ether with a molecular weight of 2400 and 5.5 g of maleic anhydride-β-cyclodextrin into the reactor, and then add 60.0 g of deionized water to prepare a monomer mass concentration of 69% macromonomer solution, then add 2.0g solution A, after stirring evenly, add 1.5g 27.5% hydrogen peroxide solution. After the above mixture was stirred for 10 minutes, solution B, the remaining solution A and solution C were added dropwise under nitrogen protection, and the addition was controlled within 2.0, ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com