Anti-reflective micro-nano structure of sapphire surface and preparation method thereof
A micro-nano structure and sapphire technology, applied in the field of optical windows, can solve the problems of poor film adhesion, permeation and diffusion, and high overall cost, and achieve obvious anti-reflection and anti-reflection and hydrophilic self-cleaning. graphic distortion effect
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Embodiment 1
[0036] Step A: Prepare a layer of metal aluminum film on the surface of sapphire: sputter a layer of aluminum film with a thickness of about 1 μm on the surface of sapphire by magnetron sputtering;
[0037] Step B: Anodizing the aluminum film on the surface of the sapphire into an aluminum oxide film with a uniform and orderly porous surface, the anodizing is carried out in 0.3mol / L oxalic acid electrolytic solution, the oxidation temperature is 0°C, and the oxidation voltage is 40V; It is generally divided into the first anodic oxidation, chemical melting film, the second anodic oxidation and hole expansion process. The first anodic oxidation time is 30min; the chemical melting film is carried out in a mixture of 6wt.% phosphoric acid and 1.8wt.% chromic acid at 60°C for 10min; the second oxidation time is also 30min; The pores were expanded in phosphoric acid solution, and the expansion time was 40 minutes.
[0038] Step C: Low-temperature heat treatment: put the sapphire s...
Embodiment 2
[0040] The difference between Example 2 and Example 1 is that step B is changed to directly expand the holes after one anodic oxidation, and other steps remain unchanged.
Embodiment 3
[0041] The difference between Example 3 and Example 1 is that only the anodizing temperature of step B is changed to 15° C., and other steps remain unchanged.
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