Decorative-material-attached substrate and manufacturing method therefor, touch panel and information display device
A decorative material and a manufacturing method technology, which are applied in identification devices, input/output processes of data processing, instruments, etc., can solve problems such as difficulty in improving optical density, and achieve the effect of small b value
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Embodiment 1~ Embodiment 3 and comparative example 1
[0267]
[0268] Black coloring liquid 1 - black coloring liquid 4, white coloring liquid 1, and white coloring liquid 2 described in Table 1 below were prepared using the following materials.
[0269] [Table 1]
[0270]
[0271]
[0272] ・Black dispersion liquid 1 (GB4016, manufactured by Sanyo Pigment Co., Ltd., the following composition)
[0273] Black pigment (carbon black) 25.0% by mass
[0274] Dispersion aid 9.5% by mass
[0275] Dispersion solvent (propylene glycol monomethyl ether acetate) 65.5% by mass
[0276] · Black dispersion liquid 2 (CDP-K106, manufactured by FUJIFILM Electronic Materials Co., Ltd., the following composition)
[0277] Black pigment (titanium dioxide) 25.0% by mass
[0278] Dispersion aid 7.0% by mass
[0279] Dispersion solvent (methyl ethyl ketone) 68.0% by mass
[0280] ・White dispersion (FP White (FP White) B422, manufactured by Sanyo Pigment Co., Ltd., with the following composition)
Embodiment 101
[0363] [Example 101: Production of touch screen]
[0364] "Formation of the first transparent electrode pattern"
[0365]
[0366] The base material with decoration material of each embodiment is introduced into the vacuum chamber, using SnO 2 The ITO target (target) (indium: tin=95:5 (molar ratio)) with a content rate of 10% by mass was subjected to direct current (Direct Current, DC) magnetron sputtering (condition: the temperature of the base material was 250° C. , the argon gas pressure is 0.13Pa, and the oxygen pressure is 0.01Pa) to form an ITO thin film with a thickness of 40nm to obtain a front panel with a transparent electrode layer formed thereon. The surface resistance of the ITO thin film was 80Ω / □.
[0367]
[0368] In the preparation of the white transfer material 1 of the above-mentioned production example 1, the above-mentioned white coloring liquid 1 was replaced with the coating liquid for the photocurable resin layer for etching containing the followi...
Embodiment 106
[0441] The front panel of Example 106 was obtained by performing the same operations as in Example 101, except that the base material with a decorative material of Example 6 was used instead of the base material with a decorative material of Example 1. This front panel is also preferable as the front panels of other embodiments.
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