Method for manufacturing active area of broadband spectrum indium arsenide/indium phosphide quantum dot laser
A technology of indium arsenide and indium quantum, which is applied in lasers, phonon exciters, laser components, etc., can solve the problems of low luminous efficiency of quantum dots and achieve good optical performance
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[0030] refer to figure 1 and figure 2 , a method for making an active region of a wide-spectrum indium arsenide / indium phosphide quantum dot laser, comprising the steps of:
[0031] Step 1: Select an indium phosphide substrate 1;
[0032] Step 2: growing an indium phosphide buffer layer 2 on the indium phosphide substrate 1; the growth temperature of the indium phosphide buffer layer 2 is 645°C; the growth thickness is 300nm, and the molar ratio of group V and group III sources is 200 ;
[0033] Step 3: growing a lattice-matched InGaAsP thin layer 3 on the InP buffer layer 2; the growth temperature of the InGaAsP thin layer 3 is 645°C, and its growth rate is 0.5nm / s, V The / III ratio was 150. This layer serves as the lower barrier layer of the active region;
[0034] Step 4: Prepare a multi-period indium arsenide quantum dot active layer 4 on the indium gallium arsenide phosphorus thin layer 3, the indium arsenide quantum dot active layer 4 includes three periods of indi...
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