Dry type etching machine and gathering device for gathering magnetic particles in gas

A dry etching, magnetic particle technology, applied in magnetic separation, solid separation, chemical instruments and methods, etc., can solve the problems of affecting the smoothness of the gas in the pipeline, reducing the air extraction efficiency and service life of the air extraction device, and improve the air extraction efficiency. and service life, simple structure, easy to popularize and apply

Inactive Publication Date: 2015-04-01
SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] After the dry etching machine is frequently used, magnetic particles will deposit inside the ventilation device, greatly reducing the ventilation efficiency and service life of the ventilation device
At the same time, magnetic particles will also accumulate at the corners and necks of the pipeline, affecting the smoothness of the gas in the pipeline

Method used

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  • Dry type etching machine and gathering device for gathering magnetic particles in gas
  • Dry type etching machine and gathering device for gathering magnetic particles in gas
  • Dry type etching machine and gathering device for gathering magnetic particles in gas

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Embodiment Construction

[0026] The present invention will be further described below in conjunction with accompanying drawing.

[0027] figure 1 A dry etcher 50 according to the invention is shown. The dry etching machine 50 includes an etching device 20 . When the etching device 20 performs dry etching on a special object to be etched, such as a metal-doped low-temperature polysilicon layer (ie, the semiconductor active layer of the array substrate), a gas with a large amount of magnetic particles will be generated. The main components of the magnetic particles include AlCl3 aluminum trichloride and MoClx molybdenum chloride. These magnetic particles can only show magnetism after magnetization, which can be attracted by magnetic substances, such as electromagnets or permanent magnets.

[0028] At the same time, the dry etching machine 50 also includes a ventilation device 30 capable of extracting gas from the etching device 20 , and a trapping device 10 disposed between the etching device 20 and ...

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PUM

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Abstract

The invention relates to a dry type etching machine and a gathering device for gathering magnetic particles in the gas. The dry type etching machine sequentially comprises an etching device, an air draft device and the gathering device in the gas flowing direction, wherein the gathering device is arranged between the etching device and the air draft device. The gathering device comprises a casing and a magnetic filtering unit arranged in the casing. Channels are formed between the magnetic filtering unit and the casing, and / or in the magnetic filtering unit, wherein the magnetic filtering unit can adsorb the magnetic particles in the gas flowing through the channels to prevent the magnetic particles from being deposited in the air draft device, therefore, the air draft efficiency of the air draft device is increased, and the service life of the air draft device is prolonged.

Description

technical field [0001] The invention relates to a dry etching machine and a trapping device for trapping magnetic particles in gas. Background technique [0002] The dry etching machine includes an etching device, an exhaust device that can extract gas from the etching device, an exhaust gas treatment device that can purify the gas discharged from the exhaust device, and pipes for connecting each device in sequence along the direction of gas flow. [0003] When the etching device of the dry etching machine performs dry etching on a special object to be etched, such as a metal-doped low-temperature polysilicon layer (ie, the semiconductor active layer of the array substrate), a gas with a large amount of magnetic particles will be generated. The main components of the magnetic particles include aluminum trichloride (chemical formula AlCl 3 ) and molybdenum chloride (chemical formula MoCl x ). [0004] After the dry etching machine is frequently used, magnetic particles wil...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/08B03C1/02
CPCB03C1/02C23F1/08
Inventor 肖文欢
Owner SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
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