A kind of etchant for touch screen and preparation method thereof

Abstract

The invention relates to the technical field of etching solution, in particular to an etching solution for a touch screen and a preparation method thereof. Each liter of the etching solution consists of the following raw materials: 180-220 mL of hydrochloric acid, 5-20 g of sodium dihydrogen phosphate, 70-90 mL of hydrofluoric acid, Hydrogen peroxide 40-50mL, 4-methyl-5-(2-acetoxyethyl)thiazole 3-7mL, cetylpyridinium chloride 0.1-1mL, the balance is water. The present invention replaces ferric chloride with hydrofluoric acid and hydrogen peroxide, so there is no need to frequently replace the etching solution, which not only saves resources but also reduces pollution to the environment. Used in conjunction with sodium dihydrogen phosphate, hydrochloric acid, hydrofluoric acid, and hydrogen peroxide, the etching is stable, the etching speed is moderate, and the etching is uniform. The edges of the etched electrode pattern are neat and there is basically no side etching.

Description

technical field [0001] The invention relates to the technical field of etching solution, in particular to an etching solution for a touch screen and a preparation method thereof. Background technique [0002] With the rapid development of information technology and flat display technology, the application of touch screens is becoming more and more common. As large as information query systems in public places, as small as personal computers, tablet computers, and mobile phones, touch screens are closely related to our lives. The indium tin oxide (ITO) conductive film used in the touch screen has many advantages such as low resistivity, good light transmission, good high temperature stability and simple preparation and graphics processing technology. It is an ideal transparent electrode material and is widely used in Used as a transparent electrode on flat panel displays such as LCD, PDP, FED, OLED / PLED, etc. [0003] In order to prepare the required electrode pattern, it i...

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Problems solved by technology

[0004] The commonly used ITO etching solution in the prior art is mainly made of hydrochloric acid or nitric acid, FeCl3, pure water and additives, which are mixed and filtered through stirring, but the etching speed of the etching solution is fast, the amount of side etching is large, the etching solution is unstable, and it is difficult to Control the etching angle and the etching amount of the metal layer, and because the etching solution contains FeCl3, the etching solution needs to be replaced frequently, which not only causes a waste of resources, but also causes environmental pollution