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Manufacturing method of metal powder

A metal powder and manufacturing method technology, applied in the direction of plasma, electrical components, etc., can solve the problems of reduced manufacturing efficiency, deterioration, and plasma non-ignition, and achieve the effects of reducing the amount of contamination, improving life, and preventing material deterioration

Active Publication Date: 2016-11-23
SHOEI CHEM IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The reason for this is that when oxygen is introduced into the reaction vessel, an oxide film is formed on the surface of the molten metal to lower the production efficiency, the heat insulating material of the reaction vessel such as graphite burns, or when a large amount of oxygen exists in the reaction vessel, the plasma The characteristics change and become unstable, which deteriorates the manufacturing efficiency and eventually causes problems such as plasma misfire
In addition, in direct current plasma, there is also a problem that the electrode metal is oxidized and deteriorated.

Method used

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  • Manufacturing method of metal powder
  • Manufacturing method of metal powder
  • Manufacturing method of metal powder

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0083] Into the reaction vessel of the above-mentioned plasma device with a supply rate of about 3.0-4.0Kg / hr, a metal nickel block as a metal raw material is supplied, and argon as a gas for generating plasma is supplied at a flow rate of 70 L / min, and argon is supplied at a flow rate of 630 to 630 L / min. Nitrogen as a diluent gas was supplied at 650 L / min, air was supplied so that the amount of oxygen was the flow rate shown in Table 1, and the device was operated for 500 hours at a plasma output of about 100 kW to produce nickel powder.

[0084] The production rate of nickel powder (supply rate of metal nickel lumps), the supply amount of oxygen into the reaction vessel, the specific surface area of ​​the obtained nickel powder, the Ca content and Zr content as impurities, and the oxygen content are shown in the table together. 1.

[0085] It should be noted that the specific surface area of ​​the powder was measured by the BET method, the Ca content and the Zr content were...

Embodiment 2

[0091] In order to dope nickel powder with sulfur, hydrogen sulfide (H 2 S) Nickel powder was produced in the same manner as in Example 1 except that the gas was supplied into the reaction container.

[0092] Table 2 shows the production rate of nickel powder (supply rate of metal nickel lump), the supply amount of oxygen into the reaction vessel, the specific surface area of ​​the obtained nickel powder, the Ca content and Zr content as impurities, and the oxygen and sulfur content. . In addition, the sulfur content was measured with a carbon / sulfur measuring device (Horiba Manufacturing Co., Ltd. EMIA-320V).

[0093] [Table 2]

[0094]

[0095] From the results shown in Table 2, it was revealed that a significant impurity reduction effect was exhibited by supplying oxygen into the reaction container.

Embodiment 3

[0097]Into the reaction container of the above-mentioned plasma device, a metal copper block as a metal raw material was supplied at a supply rate of about 6.5 to 7.5 Kg / hr, and in order to dope copper powder with phosphorus, an oxygen supply part 11 was used together with air at a rate of 1 mL / hr. A copper powder was produced in the same manner as in Example 2 except that liquid triphenylphosphine was supplied into the reaction vessel at a speed of min (0.00419 mol / min).

[0098] Table 3 shows the production rate of copper powder (supply rate of metallic copper), the supply amount of oxygen into the reaction vessel, the specific surface area of ​​the obtained copper powder, the Ca content and Zr content as impurities, and the oxygen and phosphorus content. In addition, the phosphorus content was measured with a fluorescent X-ray analyzer (Rigaku ZSX 100e).

[0099] [table 3]

[0100]

[0101] From the results shown in Table 3, it was revealed that a significant impurity r...

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Abstract

The present invention provides a method for producing metal powder, which uses plasma to melt at least a part of the metal raw material in a reaction vessel to form a molten metal, and then evaporates the molten metal (8) to generate metal vapor, and the metal The vapor, together with the carrier gas supplied to the reaction vessel, is sent from the reaction vessel to the cooling pipe to be cooled and condensed to produce metal powder. Oxygen is supplied to the reaction vessel.

Description

technical field [0001] The present invention relates to a metal powder production method for producing metal powder with few impurities by a plasma method. Background technique [0002] In the manufacture of electronic components such as electronic circuits, wiring boards, resistors, capacitors, and IC packages, conductive metal powders are used to form conductive coatings or electrodes. The characteristics and properties required for such metal powders include fine powder with few impurities, average particle size of about 0.01 to 10 μm, uniform particle shape or particle size, less aggregation, good dispersibility in paste, and crystallization. good sex etc. [0003] In recent years, along with the miniaturization of electronic components and wiring boards, thinner layers and finer pitches of conductive coatings and electrodes have progressed, and finer, spherical, and highly crystalline metal powders have been demanded. [0004] As one of the methods of producing such f...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B22F9/14B22F9/12H05H1/42C22C9/00C22C19/03
CPCB22F9/12H05H1/48B22F3/003B22F2999/00H05H1/471B22F2202/13B22F9/06B22F9/14
Inventor 清水史幸前川雅之西川友隆
Owner SHOEI CHEM IND CO LTD
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