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A kind of ingan/algan-gan base multiple quantum well structure and preparation method thereof

A quantum well and quantum well layer technology, applied in the field of InGaN/AlGaN-GaN-based multi-quantum well structure and its preparation, can solve the problems of low luminous efficiency and low recombination probability, so as to improve luminous efficiency and recombination probability , the effect of high internal quantum efficiency

Active Publication Date: 2016-08-31
TAIYUAN UNIV OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The technical problem to be solved by the present invention is that the recombination probability of multi-quantum well carriers in the prior art is low, and the luminous efficiency is not high.

Method used

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  • A kind of ingan/algan-gan base multiple quantum well structure and preparation method thereof
  • A kind of ingan/algan-gan base multiple quantum well structure and preparation method thereof

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Embodiment 1

[0032] This embodiment provides a kind of LED structure, its structure is as follows figure 1 As shown, along the growth direction, there are sapphire substrate, low-temperature GaN nucleation layer 1, high-temperature undoped u-GaN layer 2, Si-doped n-GaN layer 3, and the InGaN / AlGaN-GaN-based multiquantum Well structure 4 , p-AlGaN electron blocking layer 5 and Mg-doped p-GaN layer 6 .

[0033] Wherein, the structure of the InGaN / AlGaN-GaN-based multiple quantum wells is as follows figure 2 As shown, the order along the growth direction is: the first AlGaN-GaN barrier layer, the InGaN quantum well layer with fixed In composition, the second AlGaN-GaN barrier layer, the InGaN quantum well layer with fixed In composition, the third AlGaN- GaN barrier layer, InGaN quantum well layer with fixed In composition, fourth AlGaN-GaN barrier layer, InGaN quantum well layer with fixed In composition, fifth AlGaN-GaN barrier layer, InGaN quantum well layer with fixed In composition, A...

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Abstract

The invention relates to an InGaN / AlGaN-GaN based multiple-quantum well structure and a preparation method thereof. In the preparation method, InGaN for fixing the In component is taken as a well layer, different AlGaN-GaN are used as barrier layers including an AlGaN barrier layer for fixing the Al component, an AlGaN barrier layer with the Al component continuously reduced along a growth direction, and a GaN barrier layer. The InGaN / AlGaN-GaN based multiple-quantum well structure is capable of effectively relieving stress at the barrier and well interface, reducing bending of energy bands, controlling electron and hole radiative recombination regions and improving electron and hole injection efficiency and radiative recombination efficiency, thereby facilitating achievement of GaN based LED structures with good crystal quality, high internal quantum efficiency and high luminous efficiency.

Description

technical field [0001] The invention relates to an InGaN / AlGaN-GaN-based multi-quantum well structure and a preparation method thereof, belonging to the technical field of semiconductors. Background technique [0002] GaN-based light-emitting diodes (LEDs) can directly convert electrical energy into light energy, and the photoelectric conversion efficiency far exceeds that of traditional incandescent and fluorescent lamps. It can emit the entire wavelength band from ultraviolet to visible light, so it has a wide range of applications in indicator lights, backlights, displays, household and commercial lighting and other fields. However, in the epitaxially grown GaN-based LED structure, due to the bipolar input of carriers, electrons and holes are respectively concentrated in the quantum wells near the N-type doped region and the P-type doped region, causing the carrier In the uneven distribution between quantum wells, the overlap integral of the wave function of electrons an...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/06H01L33/26H01L33/00
CPCH01L33/0066H01L33/0075H01L33/06H01L33/325
Inventor 贾伟曹锐李天保翟光美党随虎许并社
Owner TAIYUAN UNIV OF TECH
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